Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS3 | P29474 | 1/20 | 0.32 |
| ▸ | NOS1 | P29475 | 1/20 | 0.32 |
| ▸ | NOS2 | P35228 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.32 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7739764 | 1.00 | NOS3 (0.32) | NOS3NOS1NOS2KMT2AALDH1A1 | |
| SCHEMBL1437785 | 1.00 | NOS3 (0.32) | NOS3NOS1NOS2KMT2AALDH1A1 | |
| SCHEMBL258276 | 1.00 | — | — | |
| SCHEMBL21114222 | 1.00 | NOS3 (0.32) | NOS3NOS1NOS2KMT2AALDH1A1 | |
| SCHEMBL96631 | 1.00 | NOS3 (0.32) | NOS3NOS1NOS2KMT2AALDH1A1 | |
| SCHEMBL73158 | 1.00 | — | — | |
| SCHEMBL27356307 | 0.97 | — | — | |
| SCHEMBL65158 | 0.96 | — | — | |
| SCHEMBL189624 | 0.89 | — | — | |
| SCHEMBL43432 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9057951-B2 | Chemically amplified photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-06-16 | — | — | US | claimed |
| WO-2011023497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | WO | claimed |
| CN-110462516-B | Positive photoresist composition, pattern produced therefrom and method for producing pattern | 株式会社LG化学 | 2023-01-17 | — | — | CN | disclosed |
| US-11531268-B2 | Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern | LG CHEM, LTD. (KR) | 2022-12-20 | — | — | US | disclosed |
| CN-109429511-B | Positive photoresist composition, photoresist pattern using the same, and method for manufacturing photoresist pattern | 株式会社LG化学 | 2022-01-28 | — | — | CN | disclosed |
| CN-109790284-B | Polyphenol compound and process for producing the same | 三菱化学株式会社 | 2021-09-21 | — | — | CN | disclosed |
| US-11003077-B2 | Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern | LG CHEM, LTD. (KR) | 2021-05-11 | — | — | US | disclosed |
| US-10851039-B2 | Polyhydric phenol compound and method of producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2020-12-01 | — | — | US | disclosed |
| US-10793499-B2 | — | — | 2020-10-06 | — | — | US | disclosed |
| EP-3514193-A1 | POLYVALENT PHENOL COMPOUND AND METHOD OF PRODUCING SAME | Mitsubishi Chemical Corporation (JP) | 2019-07-24 | — | — | EP | disclosed |
| US-20190210947-A1 | POLYHYDRIC PHENOL COMPOUND AND METHOD OF PRODUCING SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-07-11 | — | — | US | disclosed |
| US-20190146338-A1 | POSITIVE PHOTORESIST COMPOSITION, PHOTORESIST PATTERN USING THE SAME, AND MANUFACTURING METHOD OF THE PHOTORESIST PATTERN | LG CHEM, LTD. (KR) | 2019-05-16 | — | — | US | disclosed |
| US-9057951-B2 | Chemically amplified photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-06-16 | — | — | US | disclosed |
| WO-2011023497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | WO | disclosed |
| US-6245727-B1 | Discontinuous process for conducting a heterogeneously catalyzed reaction and installation for heterogeneously catalyzed manufacture of products | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2001-06-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190210947-A1 | POLYHYDRIC PHENOL COMPOUND AND METHOD OF PRODUCING SAME | RB1, FHIT, H1-4 | NOS3 3204/4885NOS1 2733/4885NOS2 2117/4885 |
| US-10851039-B2 | Polyhydric phenol compound and method of producing same | RB1, FHIT, H1-4 | NOS3 3204/4885NOS1 2733/4885NOS2 2117/4885 |
| US-10793499-B2 | — | RB1, H1-4, TPD52L2 | NOS3 2808/4885NOS1 2523/4885NOS2 2068/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.