Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 12/20 | 0.49 |
| ▸ | CA2 | P00918 | 12/20 | 0.49 |
| ▸ | CA12 | O43570 | 10/20 | 0.49 |
| ▸ | CA7 | P43166 | 10/20 | 0.49 |
| ▸ | CA13 | Q8N1Q1 | 10/20 | 0.49 |
| ▸ | CA9 | Q16790 | 4/20 | 0.49 |
| ▸ | CA4 | P22748 | 2/20 | 0.44 |
| ▸ | CA6 | P23280 | 2/20 | 0.44 |
| ▸ | CA5A | P35218 | 2/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.44 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.44 |
| ▸ | CA3 | P07451 | 1/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
| ▸ | MMP13 | P45452 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19296219 | 0.83 | CA12 (0.52) | CA1CA2CA12CA7CA13 | |
| SCHEMBL17399676 | 0.79 | CA2 (0.41) | CA1CA2CA12CA7CA13 | |
| SCHEMBL12172747 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL16313656 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL112773 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL12689958 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL10172873 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2611770 | 0.79 | CA2 (0.53) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2314662 | 0.78 | CA12 (0.40) | CA1CA2CA12CA7CA13 | |
| SCHEMBL683699 | 0.77 | CA1 (0.40) | CA1CA2CA12CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |