SCHEMBL1444753

SCHEMBL1444753

CC(C#N)CN=N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6522065 0.79 TSHR (0.43)
SCHEMBL121 0.79 TSHR (0.43)
SCHEMBL142610 0.79 TSHR (0.43)
Hydrochloric Acid SCHEMBL9508593 0.77 TSHR (0.42)
SCHEMBL10454453 0.77 TSHR (0.42)
SCHEMBL28053204 0.76
SCHEMBL17985137 0.74
SCHEMBL9860811 0.74 TSHR (0.46)
SCHEMBL27648153 0.73 TSHR (0.31)
SCHEMBL4476401 0.72 TSHR (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103339567-A Colored photosensitive composition ADEKA CORP 2013-10-02 CN disclosed
CN-102549497-B Photosensitive resin composition and method for producing photosensitive resin film TORAY INDUSTRIES 2013-07-31 CN disclosed
CN-103028123-A Stabalised 99mTc compositions GE HEALTHCARE LTD 2013-04-10 CN disclosed
CN-102812399-A Photosensitive conductive paste and method for forming conductive pattern TORAY INDUSTRIES 2012-12-05 CN disclosed
CN-101354533-B Photosensitive paste composition and pattern forming method JSR CORP 2012-10-10 CN disclosed
EP-2478021-A1 NITRILE RUBBERS AND PRODUCTION THEREOF IN ORGANIC SOLVENTS Lanxess Deutschland GmbH (DE) 2012-07-25 EP disclosed
CN-102549497-A Photosensitive resin composition and method for producing photosensitive resin film TORAY INDUSTRIES 2012-07-04 CN disclosed
CN-101059656-B Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern JSR CORP 2012-05-16 CN disclosed
WO-2011032832-A1 NITRILE RUBBERS AND PRODUCTION THEREOF IN ORGANIC SOLVENTS LANXESS DEUTSCHLAND GMBH (DE) 2011-03-24 WO disclosed
CN-101529334-A Photosensitive resin composition, photosensitive film, and method for formation of pattern JSR CORP (JP) 2009-09-09 CN disclosed
CN-1238765-C Sensitive paste-like material, plasma display and mfg. method thereof TORAY INDUSTRIES (JP) 2006-01-25 CN disclosed
CN-1629726-A Paste, display member, and process for production of display member TORAY INDUSTRIES (JP) 2005-06-22 CN disclosed
CN-1515962-A Sensitive paste-like material, plasma display and mfg. method thereof 东丽株式会社 2004-07-28 CN disclosed
CN-1119701-C Photosensitive paste, plasma display and process for production thereof TORAY INDUSTRIES (JP) 2003-08-27 CN disclosed
CN-1325038-A Paste material display device and mfg. method for display device TORAY INDUSTRIES (JP) 2001-12-05 CN disclosed
CN-1157042-A Photosensitive paste, plasma display and process for production thereof TORAY INDUSTRIES (JP) 1997-08-13 CN disclosed
CN-1031828-C Ligands and cationic complexes thereof with technetium-99m AMERSHAM INT PLC (GB) 1996-05-22 CN disclosed
CN-1079746-A A kind of manufacture method that has the cationic complexes of technetium-99m AMERSHAM INT PLC (GB) 1993-12-22 CN disclosed
CN-1022633-C Process for preparing ligand AMERSHAM INT PLC (GB) 1993-11-03 CN disclosed
CN-1040373-A Ligands and cationic complexes thereof with technetium-99 m AMERSHAM INT PLC (GB) 1990-03-14 CN disclosed