SCHEMBL14461593

SCHEMBL14461593

CC(COc1cccc2ccccc12)OC1CCCCC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.52
▸ KMT2A Q03164 2/20 0.52
▸ NR2E1 Q9Y466 6/20 0.50
▸ CYP2D6 P10635 4/20 0.50
▸ ADRB2 P07550 4/20 0.50
▸ ADRB1 P08588 4/20 0.50
▸ SIGMAR1 Q99720 4/20 0.50
▸ ALDH1A1 P00352 4/20 0.50
▸ CYP1A2 P05177 4/20 0.50
▸ SLC6A4 P31645 3/20 0.50
▸ HTR2B P41595 3/20 0.50
▸ ADRB3 P13945 3/20 0.50
▸ HTR2A P28223 3/20 0.50
▸ HTR2C P28335 3/20 0.50
▸ HTR6 P50406 3/20 0.50
▸ TSHR P16473 3/20 0.50
▸ HTR1B P28222 3/20 0.50
▸ SCN1A P35498 2/20 0.50
▸ SLC10A1 Q14973 2/20 0.50
▸ SCN2A Q99250 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14461993 0.82 MEN1 (0.50) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL14461613 0.78 ADRB2 (0.45) MEN1KMT2ACYP2D6ADRB2ADRB1
SCHEMBL14667605 0.77 SLC18A2 (0.47) CYP2D6SIGMAR1CYP1A2DRD3DRD4
SCHEMBL14461816 0.77 MEN1 (0.42) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL14461598 0.76 NR2E1 (0.62) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL8644783 0.76 CYP1A2 (0.61) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL14461810 0.75 MEN1 (0.40) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL14461596 0.75 NR2E1 (0.61) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL29829725 0.74 NR2E1 (0.64) MEN1KMT2ANR2E1CYP2D6ADRB2
SCHEMBL5031818 0.74 NR2E1 (0.64) MEN1KMT2ANR2E1CYP2D6ADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 — — US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 — — US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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