Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.42 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.40 |
| ▸ | METAP2 | P50579 | 2/20 | 0.39 |
| ▸ | DRD2 | P14416 | 1/20 | 0.39 |
| ▸ | DRD4 | P21917 | 1/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14667608 | 0.80 | ACHE (0.38) | ACHESIGMAR1CYP2D6CYP1A2 | |
| SCHEMBL1836850 | 0.78 | HRH3 (0.39) | CYP2D6CYP1A2 | |
| SCHEMBL14461593 | 0.77 | MEN1 (0.52) | SIGMAR1CYP2D6CYP1A2CYP2C19DRD4 | |
| SCHEMBL14667587 | 0.77 | PDE4A (0.46) | SLC18A2SIGMAR1CYP2D6CYP1A2 | |
| SCHEMBL1836994 | 0.77 | LMNA (0.39) | CYP2D6CYP1A2 | |
| SCHEMBL1840784 | 0.77 | LMNA (0.39) | CYP2D6CYP1A2 | |
| SCHEMBL1838160 | 0.77 | LMNA (0.39) | CYP2D6CYP1A2 | |
| SCHEMBL14667708 | 0.76 | PPARG (0.37) | SLC18A2CYP2D6CYP1A2DRD2DRD4 | |
| SCHEMBL14667603 | 0.76 | CYP1A2 (0.46) | SLC18A2SIGMAR1CYP2D6CYP1A2CYP2C19 | |
| SCHEMBL2702521 | 0.76 | PDE4A (0.45) | SLC18A2SIGMAR1CYP2D6CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |