SCHEMBL14462011

SCHEMBL14462011

CCC(C)c1ccc(OC(COc2ccc(C(C)(C)C)cc2)Oc2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.46
TSHR P16473 1/20 0.46
LMNA P02545 1/20 0.40
HSD17B10 Q99714 1/20 0.40
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
SLC7A5 Q01650 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39
GRIA4 P48058 2/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
APP P05067 1/20 0.37
HSP90AA1 P07900 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14924837 0.83 ALDH1A1 (0.54) ALDH1A1TSHRLMNAMEN1KMT2A
SCHEMBL10148362 0.80 ALDH1A1 (0.45) ALDH1A1TSHRLMNAMEN1KMT2A
SCHEMBL14924830 0.79 APP (0.60) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL14866960 0.79 APP (0.60) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL18092983 0.79 GRIA4 (0.53) ALDH1A1TSHRLMNAHSD17B10GAA
SCHEMBL548052 0.79 GRIA4 (0.53) ALDH1A1TSHRLMNAHSD17B10GAA
SCHEMBL16683123 0.77 ALDH1A1 (0.49) ALDH1A1TSHRLMNAMEN1KMT2A
SCHEMBL16382391 0.76 ALDH1A1 (0.48) ALDH1A1TSHRLMNAMEN1KMT2A
SCHEMBL15195768 0.75 FFAR1 (0.48) ALDH1A1TSHRLMNAHSD17B10MEN1
SCHEMBL11513887 0.74 GRIA4 (0.49) ALDH1A1TSHRLMNAGRIA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed