SCHEMBL14924837

SCHEMBL14924837

CCC(C)c1ccc(OCCOc2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.54
TSHR P16473 1/20 0.51
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
TDP1 Q9NUW8 1/20 0.50
KDM4E B2RXH2 1/20 0.46
HRH3 Q9Y5N1 2/20 0.44
SMN1; SMN2 Q16637 3/20 0.44
LMNA P02545 2/20 0.43
GRIA4 P48058 2/20 0.43
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
APP P05067 1/20 0.41
MITF O75030 1/20 0.41
TP53 P04637 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14866849 0.89 APP (0.47) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL10148362 0.89 ALDH1A1 (0.45) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL14924830 0.86 APP (0.60) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL14866960 0.86 APP (0.60) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL18092983 0.86 GRIA4 (0.53) ALDH1A1TSHRLMNAGRIA4TP53
SCHEMBL548052 0.86 GRIA4 (0.53) ALDH1A1TSHRLMNAGRIA4TP53
SCHEMBL14866851 0.85 TDP1 (0.51) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL20152110 0.83 ALDH1A1 (0.54) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL14462011 0.83 ALDH1A1 (0.46) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL13018299 0.83 ALDH1A1 (0.40) ALDH1A1TSHRMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 US disclosed