SCHEMBL1446367

SCHEMBL1446367

CC/C=C/C(CCCCCCC)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.50
FFAR1 O14842 1/20 0.50
MAPT P10636 1/20 0.48
LCK P06239 1/20 0.48
PPARD Q03181 1/20 0.48
ZDHHC20 Q5W0Z9 1/20 0.48
ZDHHC2 Q9UIJ5 1/20 0.48
ACE2 Q9BYF1 1/20 0.46
HSPD1 P10809 1/20 0.42
BLM P54132 1/20 0.42
HSPE1 P61604 1/20 0.42
GRIK1 P39086 1/20 0.42
GRIK2 Q13002 1/20 0.42
PPARG P37231 2/20 0.42
GPR132 Q9UNW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1446370 1.00 GPR84 (0.50) GPR84FFAR1MAPTLCKPPARD
SCHEMBL1129485 0.92 CA2 (0.45) GPR84FFAR1MAPTLCKPPARD
SCHEMBL1129486 0.92 CA2 (0.45) GPR84FFAR1MAPTLCKPPARD
SCHEMBL19830159 0.90 GPR84 (0.44) GPR84FFAR1MAPTLCKPPARD
SCHEMBL19830163 0.90 GPR84 (0.44) GPR84FFAR1MAPTLCKPPARD
SCHEMBL12942472 0.90 GPR84 (0.44) GPR84FFAR1MAPTLCKPPARD
SCHEMBL16927610 0.87 GPR84 (0.48) GPR84FFAR1MAPTLCKPPARD
SCHEMBL14039917 0.87 GPR84 (0.48) GPR84FFAR1MAPTLCKPPARD
SCHEMBL16927601 0.87 PPARG (0.51) MAPTPPARDBLMPPARGGPR132
SCHEMBL16927600 0.87 PPARG (0.51) MAPTPPARDBLMPPARGGPR132

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7910290-B2 Photoresist topcoat for a photolithographic process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-03-22 US disclosed
US-7901868-B2 Mixtures of functionalized polyhedral oligomeric silsesquioxanes derivatives; immersion photolithography; water insolubility, soluble in photoresist developer and casting solvents, leaching inhibition; resolution INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-03-08 US disclosed
US-20090011377-A1 PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS ALLEN ROBERT DAVID 2009-01-08 US disclosed
US-20080227028-A1 PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS ALLEN ROBERT DAVID 2008-09-18 US disclosed
US-7399581-B2 Photoresist topcoat for a photolithographic process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-07-15 US disclosed
US-7141692-B2 Molecular photoresists containing nonpolymeric silsesquioxanes INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-11-28 US disclosed
US-20060189779-A1 Photoresist topcoat for a photolithographic process INTERNATIONAL BUSINESS MACHINES CORPORATION 2006-08-24 US disclosed
CN-1260618-C Anastigmatic gum carving compsns. contg. alicyclic dissolution inhibitor AMERICAN EVERLIGHT CO (US) 2006-06-21 CN disclosed
US-20050112382-A1 Molecular photoresists containing nonpolymeric silsesquioxanes INTERNATIONAL BUSINESS MACHINES CORPORATION 2005-05-26 US disclosed
US-6441115-B1 FOR USE AS CHEMICAL AMPLIFIED PHOTORESIST, COMPRISING UNITS DERIVED FROM (METH)ACRYLIC ACID, 2-ALKYL,5,6-(-(CH2)N-)NORBORN-2-YL ESTER WHERE N IS 2-6 EVERLIGHT USA, INC. 2002-08-27 US disclosed
US-6376700-B1 PREVENTION DISSOLVING OF POSITIVE PHOTORESISTS EVERLIGHT USA, INC. 2002-04-23 US disclosed
CN-1331433-A Anastigmatic gum carving compsns. contg. alicyclic dissolution inhibitor AMERICAN EVERLIGHT CO (US) 2002-01-16 CN disclosed
US-6316159-B1 PHOTOSENSITIVE COPOLYMER WITH MALEIC ANHYDRIDE, NORBORNENE ACRYLATE EVERLIGHT USA, INC. 2001-11-13 US disclosed
US-6294309-B1 USEFUL AS A CHEMICALLY AMPLIFIED TYPE RESIST WHEN EXPOSED TO DEEP UV LIGHT FROM A KRF AND ARF EXCIMER LASER; E.G., TRANS-2,3-DIHYDROXYBICYCLO(2.2.1)HEPTAN-2-CARBOXYLIC ACID TERT-BUTYL ESTER EVERLIGHT USA, INC. 2001-09-25 US disclosed
US-6271412-B1 OBTAINED FROM THE REACTION OF ACRYLOYL CHLORIDE AND TRICYCLOALCOHOL OR ITS DERIVATIVES. EVERLIGHT USA, INC. 2001-08-07 US disclosed
US-6265131-B1 TERT-BUTYL ESTERS OF HYDROXY-SUBSTITUTED NORBORNANECARBOXYLIC ACIDS AND ANALOGS EVERLIGHT USA. INC. 2001-07-24 US disclosed