SCHEMBL14464036

SCHEMBL14464036

CCC(C)c1ccc(OC(=O)c2cccc(N(C)C)c2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FAAH O00519 1/20 0.45
▸ ALDH1A1 P00352 6/20 0.44
▸ TSHR P16473 2/20 0.44
▸ MAPT P10636 6/20 0.43
▸ KMT2A Q03164 5/20 0.43
▸ MEN1 O00255 2/20 0.43
▸ KDM4E B2RXH2 4/20 0.42
▸ PKM P14618 1/20 0.42
▸ PABPC1 P11940 1/20 0.42
▸ EIF4H Q15056 1/20 0.42
▸ CTDSP1 Q9GZU7 1/20 0.42
▸ POLB P06746 1/20 0.42
▸ LMNA P02545 2/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ HPGD P15428 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ SLC6A2 P23975 1/20 0.40
▸ SLC6A4 P31645 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10529211 0.88 ALDH1A1 (0.51) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL6721979 0.81 ALDH1A1 (0.56) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL11922881 0.79 KMT2A (0.56) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL10053089 0.78 MEN1 (0.50) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL1790126 0.78 MAPT (0.50) ALDH1A1MAPTKMT2AKDM4EPKM
SCHEMBL13144362 0.77 ALDH1A1 (0.55) FAAHALDH1A1TSHRMAPTKMT2A
SCHEMBL14665363 0.77 ALDH1A1 (0.46) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL13144217 0.76 ELANE (0.56) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL13296203 0.76 ALDH1A1 (0.50) ALDH1A1TSHRMAPTKMT2AMEN1
SCHEMBL14461699 0.76 ALDH1A1 (0.50) ALDH1A1TSHRMAPTKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8785917-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-07-22 — — US disclosed
US-8785917-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-07-22 — — US disclosed
US-20130001751-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20130001751-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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