⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14448862 | 0.84 | — | — | |
| SCHEMBL14468757 | 0.83 | — | — | |
| SCHEMBL14468503 | 0.76 | — | — | |
| SCHEMBL14532382 | 0.73 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL14468507 | 0.71 | LMNA (0.33) | — | |
| SCHEMBL5838336 | 0.70 | — | — | |
| SCHEMBL13993290 | 0.67 | ALDH1A1 (0.30) | — | |
| SCHEMBL14468759 | 0.66 | — | — | |
| SCHEMBL14468505 | 0.66 | — | — | |
| SCHEMBL14468502 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070154841-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2007-07-05 | — | — | US | disclosed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | disclosed |