Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.36 |
| ▸ | POLB | P06746 | 4/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1218695 | 0.96 | LMNA (0.41) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL11908006 | 0.86 | ALDH1A1 (0.45) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL11909283 | 0.82 | POLB (0.40) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL11908651 | 0.82 | ALDH1A1 (0.44) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL22263904 | 0.80 | ALDH1A1 (0.43) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL11908068 | 0.79 | POLB (0.39) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL1450890 | 0.78 | LMNA (0.52) | LMNAALDH1A1POLBAPEX1TDP1 | |
| SCHEMBL22263885 | 0.78 | KMT2A (0.40) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL24400988 | 0.77 | ALDH1A1 (0.42) | LMNAKDM4EALDH1A1POLBHSD17B10 | |
| SCHEMBL3365931 | 0.76 | LMNA (0.47) | LMNAKDM4EALDH1A1POLBHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115210219-A | Oxime ester photoinitiators | 巴斯夫欧洲公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-113316744-A | Oxime ester photoinitiators with specific aroyl chromophores | 巴斯夫欧洲公司 | 2021-08-27 | — | — | CN | disclosed |
| US-8609574-B2 | In situ olefin polymerization catalyst system | PROMERUS LLC (US) | 2013-12-17 | — | — | US | disclosed |
| US-8450440-B2 | Method for purifying polymer and polymer | MITSUI CHEMICALS, INC. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20120208976-A1 | METHOD FOR PURIFYING POLYMER AND POLYMER | MITSUI CHEMICALS, INC (JP) | 2012-08-16 | — | — | US | disclosed |
| EP-2296811-A2 | IN SITU OLEFIN POLYMERIZATION CATALYST SYSTEM | Promerus, LLC (US) | 2011-03-23 | — | — | EP | disclosed |
| US-7910674-B2 | Especially a copolymer of norbornene and/or alkylnorbornene and (trialkoxysilylalkyl)norbornene; optical articles such as ophthalmic lenses, wave guides, optical fibers, and optical adhesives | PROMERUS, LLC (US) | 2011-03-22 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| WO-2009132240-A2 | IN SITU OLEFIN POLYMERIZATION CATALYST SYSTEM | PROMERUS LLC (US) | 2009-10-29 | — | — | WO | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |