⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL541823 | 0.72 | — | — | |
| SCHEMBL789876 | 0.72 | — | — | |
| SCHEMBL3277370 | 0.72 | — | — | |
| SCHEMBL144817 | 0.72 | — | — | |
| SCHEMBL2734783 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL2798786 | 0.67 | — | — | |
| Ammonia Solution, Strong SCHEMBL4710472 | 0.67 | — | — | |
| SCHEMBL2468917 | 0.64 | — | — | |
| SCHEMBL21527930 | 0.62 | — | — | |
| SCHEMBL1934082 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006138131-A1 | METHOD FOR SILICON NITRIDE CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2006-12-28 | — | — | WO | claimed |
| US-20050255714-A1 | Method for silicon nitride chemical vapor deposition | APPLIED MATERIALS, INC. | 2005-11-17 | — | — | US | claimed |
| US-20190169212-A1 | AMINOCHLOROHYDRIDODISILANES | JIANGSU NATA OPTO-ELECTRONIC MATERIALS CO. LTD. (CN) | 2019-06-06 | — | — | US | disclosed |
| CN-108558926-A | Organoaminodisilane precursors and methods of thin film deposition comprising the same | 弗萨姆材料美国有限责任公司 | 2018-09-21 | — | — | CN | disclosed |
| CN-103450242-B | Organoaminodisilane precursors and methods of thin film deposition comprising the same | 弗萨姆材料美国有限责任公司 | 2018-05-01 | — | — | CN | disclosed |
| US-9840523-B2 | Process of synthesizing diisopropylamino-disilanes | DOW CORNING CORPORATION (US) | 2017-12-12 | — | — | US | disclosed |
| WO-2017200908-A1 | AMINOCHLOROHYDRIDODISILANES | DOW CORNING CORPORATION (US) | 2017-11-23 | — | — | WO | disclosed |
| EP-3149011-A1 | PROCESS OF SYNTHESIZING DIISOPROPYLAMINW-DISILANES | Dow Corning Corporation (US) | 2017-04-05 | — | — | EP | disclosed |
| US-20170029446-A1 | Process Of Synthesizing Diisopropylamino-Disilanes | DOW CORNING CORPORATION (US) | 2017-02-02 | — | — | US | disclosed |
| WO-2015184214-A1 | PROCESS OF SYNTHESIZING DIISOPROPYLAMINW-DISILANES | DOW CORNING CORPORATION (US) | 2015-12-03 | — | — | WO | disclosed |
| US-7365029-B2 | Method for silicon nitride chemical vapor deposition | APPLIED MATERIALS, INC. (US) | 2008-04-29 | — | — | US | disclosed |
| WO-2006138131-A1 | METHOD FOR SILICON NITRIDE CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2006-12-28 | — | — | WO | disclosed |
| US-20050255714-A1 | Method for silicon nitride chemical vapor deposition | APPLIED MATERIALS, INC. | 2005-11-17 | — | — | US | disclosed |