SCHEMBL14502467

SCHEMBL14502467

Cc1ccc(Oc2ccc(S(=O)(=O)ON)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 6/20 0.58
SMN1; SMN2 Q16637 4/20 0.58
TDP1 Q9NUW8 2/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
ALDH1A1 P00352 3/20 0.50
TEAD4 Q15561 1/20 0.50
FFAR1 O14842 1/20 0.49
POLB P06746 1/20 0.48
MAPT P10636 1/20 0.48
CA1 P00915 2/20 0.47
CA2 P00918 2/20 0.47
CA9 Q16790 2/20 0.47
CA12 O43570 1/20 0.47
CA3 P07451 1/20 0.47
CA6 P23280 1/20 0.47
CA5A P35218 1/20 0.47
CA7 P43166 1/20 0.47
CA5B Q9Y2D0 1/20 0.47
LMNA P02545 3/20 0.46
GAA P10253 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL928206 0.90 CA1 (0.56) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
Sulfuric Acid SCHEMBL30951756 0.84 CA1 (0.50) SMN1; SMN2ALDH1A1MAPTCA1CA2
SCHEMBL13594368 0.82 SOS1 (0.66) HTTSMN1; SMN2ALDH1A1FFAR1CA1
SCHEMBL2758531 0.82 HTT (0.63) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
SCHEMBL13814624 0.82 HTT (0.63) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
SCHEMBL14502468 0.81 MEN1 (0.54) HTTSMN1; SMN2ALDH1A1CA1CA2
SCHEMBL2606163 0.79 HTT (0.85) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
SCHEMBL10084171 0.79 HTT (0.85) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
SCHEMBL822843 0.79 HTT (0.85) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1
SCHEMBL12268296 0.79 HTT (0.85) HTTSMN1; SMN2TDP1L3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070141514-A1 Method for forming photoresist pattern and photoresist laminate YAMAZAKI AKIYOSHI 2007-06-21 US disclosed