SCHEMBL14502944

SCHEMBL14502944

CCCCOC(=O)c1ccc(Oc2ccc(C(=O)OCCCC)c(C(=O)Cl)c2)cc1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 7/20 0.54
▸ TDP1 Q9NUW8 2/20 0.54
▸ L3MBTL1 Q9Y468 2/20 0.54
▸ ALDH1A1 P00352 6/20 0.49
▸ MAPK1 P28482 3/20 0.49
▸ CYP3A4 P08684 3/20 0.49
▸ TP53 P04637 1/20 0.49
▸ LMNA P02545 3/20 0.48
▸ MEN1 O00255 1/20 0.47
▸ KMT2A Q03164 1/20 0.47
▸ HSD17B10 Q99714 1/20 0.45
▸ ESR1 P03372 3/20 0.42
▸ POLB P06746 1/20 0.42
▸ PTPN11 Q06124 1/20 0.41
▸ CYP1A2 P05177 2/20 0.41
▸ CYP2C19 P33261 2/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ NR1H2 P55055 1/20 0.41
▸ RNASEL Q05823 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11575811 0.91 TSHR (0.58) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL29779509 0.89 TSHR (0.55) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL26095403 0.89 TSHR (0.55) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL22441909 0.83 TSHR (0.59) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL28961926 0.81 TSHR (0.59) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL11573891 0.80 ALDH1A1 (0.53) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL5157510 0.80 TSHR (0.63) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL11415988 0.80 TSHR (0.61) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL301822 0.79 TSHR (0.61) TSHRTDP1L3MBTL1ALDH1A1MAPK1
SCHEMBL4138132 0.79 TSHR (0.61) TSHRTDP1L3MBTL1ALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7214455-B2 Photosensitive resin composition and process for producing heat-resistant resin film TORAY INDUSTRIES, INC. (JP) 2007-05-08 — — US disclosed
US-7214455-B2 Photosensitive resin composition and process for producing heat-resistant resin film TORAY INDUSTRIES, INC. (JP) 2007-05-08 — — US disclosed
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