Thiosulfuric Acid

Thiosulfuric Acid

SCHEMBL145198

O=S(=O)(O)S.[Au].[KH]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115710701-B Electroless gold plating solution and application 广东东硕科技有限公司 2024-12-10 CN claimed
CN-115710701-A Chemical gold plating solution and application 广东东硕科技有限公司 2023-02-24 CN claimed
CN-115182007-A Gold-palladium plating solution for electroplating copper wire and electroplating process 上海万生合金材料有限公司 2022-10-14 CN claimed
CN-113005437-B Chemical gold-precipitating liquid for printed circuit board 深圳市创智成功科技有限公司 2021-12-24 CN claimed
US-11142826-B2 Substitution-type electroless gold plating solution containing purine or pyrimidine-based compound having carbonyl oxygen and substitution-type electroless gold plating method using the same MK CHEM & TECH CO., LTD (KR) 2021-10-12 US claimed
CN-113005437-A Chemical gold-precipitating liquid for printed circuit board 深圳市创智成功科技有限公司 2021-06-22 CN claimed
US-20200095685-A1 SUBSTITUTION-TYPE ELECTROLESS GOLD PLATING SOLUTION CONTAINING PURINE OR PYRIMIDINE-BASED COMPOUND HAVING CARBONYL OXYGEN AND SUBSTITUTION-TYPE ELECTROLESS GOLD PLATING METHOD USING THE SAME MK CHEM & TECH CO., LTD (KR) 2020-03-26 US claimed
CN-119194425-A Electroless gold plating method and plating film substrate 光华科学技术研究院(广东)有限公司 2024-12-27 CN disclosed
CN-115710701-B Electroless gold plating solution and application 广东东硕科技有限公司 2024-12-10 CN disclosed
US-11993862-B2 Structure including copper plating layer or copper alloy plating layer ISHIHARA CHEMICAL CO., LTD. (JP) 2024-05-28 US disclosed
US-11946153-B2 Copper or copper alloy electroplating bath ISHIHARA CHEMICAL CO., LTD. (JP) 2024-04-02 US disclosed
CN-115710701-A Chemical gold plating solution and application 广东东硕科技有限公司 2023-02-24 CN disclosed
CN-115182007-A Gold-palladium plating solution for electroplating copper wire and electroplating process 上海万生合金材料有限公司 2022-10-14 CN disclosed
EP-0256858-B1 RAPIDLY PROCESSABLE SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1993-07-28 EP disclosed
EP-0285234-B1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1993-03-24 EP disclosed
US-4914016-A CONTAINING SULFUR KONICA CORPORATION (JP) 1990-04-03 US disclosed
US-4839270-A MOSTLY SILVER CHLORIDE GRAINS;STORAGE STABILITY, HIGH SENSITIVITY, LOW FOGGING KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-06-13 US disclosed
US-4830958-A Silver halide photographic light-sensitive material which is excellent in rapid processability and has not very much sensitivity variation caused by a change on standing in the preparation of the light-sensitive material KONICA CORPORATION (JP) 1989-05-16 US disclosed
EP-0294149-A2 Silver halide photographic light-sensitive material and processing method therefore KONICA CORPORATION (JP) 1988-12-07 EP disclosed
EP-0256858-A2 Rapidly processable silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed