SCHEMBL145247

SCHEMBL145247

Cc1cc(O)c(O)c(O)c1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SELL P14151 1/20 0.48
SELP P16109 1/20 0.48
SELE P16581 1/20 0.48
MAPT P10636 5/20 0.43
ALDH1A1 P00352 5/20 0.43
KDM4E B2RXH2 4/20 0.43
HPGD P15428 2/20 0.43
CYP3A4 P08684 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2D6 P10635 1/20 0.43
G6PD P11413 1/20 0.43
CYP2C9 P11712 1/20 0.43
PKM P14618 1/20 0.43
ALOX15 P16050 1/20 0.43
ALOX12 P18054 1/20 0.43
MAPK1 P28482 1/20 0.43
CYP2C19 P33261 1/20 0.43
CCR6 P51684 1/20 0.43
HIF1A Q16665 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29899692 0.82 ACHE (0.48) SELLSELPSELEMAPTALDH1A1
SCHEMBL2912790 0.82 SELL (0.48) SELLSELPSELEMAPTALDH1A1
SCHEMBL68397 0.82 ACHE (0.48) SELLSELPSELEMAPTALDH1A1
SCHEMBL25677567 0.79 MAPT (0.45) SELLSELPSELEMAPTALDH1A1
SCHEMBL2220478 0.79 SELL (0.50) SELLSELPSELEMAPTALDH1A1
SCHEMBL5680954 0.79 CA1 (0.50) SELLSELPSELEMAPTALDH1A1
SCHEMBL634558 0.79 SELL (0.50) SELLSELPSELEMAPTALDH1A1
SCHEMBL15485452 0.78 ALDH1A1 (0.47) SELLSELPSELEMAPTALDH1A1
SCHEMBL204468 0.78 ALDH1A1 (0.47) SELLSELPSELEMAPTALDH1A1
SCHEMBL19621120 0.77 SELL (0.48) SELLSELPSELEMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 731 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117645771-A Solvent-free high-low temperature resistant bulletproof composite matrix resin and preparation method thereof 上海鑫丰泰新材料科技有限公司 2024-03-05 CN claimed
CN-117342932-A Preparation method of 2,6-bis (2, 4-dihydroxybenzyl) -4-methylphenol 沈阳化工研究院有限公司 2024-01-05 CN claimed
US-11520083-B2 Member, imaging apparatus, and method for producing member CANON KABUSHIKI KAISHA (JP) 2022-12-06 US claimed
US-10590237-B2 Preparation of hyperbranched polycarbonate polyols and their use BASF SE (DE) 2020-03-17 US claimed
US-20180134841-A1 PREPARATION OF HYPERBRANCHED POLYCARBONATE POLYOLS AND THEIR USE BASF CORPORATION 2018-05-17 US claimed
EP-3298065-A1 PREPARATION OF HYPERBRANCHED POLYCARBONATE POLYOLS AND THEIR USE BASF SE (DE) 2018-03-28 EP claimed
CN-107683300-A The preparation of hyperbranched polycarbonates polyalcohol and its purposes 巴斯夫公司 2018-02-09 CN claimed
WO-2016186727-A1 PREPARATION OF HYPERBRANCHED POLYCARBONATE POLYOLS AND THEIR USE BASF CORPORATION (US) 2016-11-24 WO claimed
CN-104529861-A Method for synthesizing imide group modified low-molecular-weight line-type phenolic resin and sensitization imaging composition containing imide group modified low-molecular-weight line-type phenolic resin WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD 2015-04-22 CN claimed
CN-104402751-A Photosensitive imaging composition of amide phenol-containing compound or oligomer thereof WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD 2015-03-11 CN claimed
CN-101597219-A The active etherate of phenolic compound and preparation thereof WEIHAI ECONOMY & TECHNOLOGY ZO (CN) 2009-12-09 CN claimed
US-5576139-A EXCELLENT RESOLUTION, SENSITIVITY, HEAT RESISTANCE AND DEVELOPABILITY FUJI PHOTO FILM CO., LTD. (JP) 1996-11-19 US claimed
JP-9136850-A None JP disclosed
WO-2026105630-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 日産化学株式会社 2026-05-21 WO disclosed
WO-2026105628-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 日産化学株式会社 2026-05-21 WO disclosed
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film ECHEM SOLUTIONS CORP. (TW) 2026-05-19 US disclosed
EP-0032062-B1 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-04-03 EP disclosed
US-4345054-A High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1982-08-17 US disclosed
EP-0032062-A2 High-molecular-weight novolak substituted phenolic resins and their preparation MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1981-07-15 EP disclosed
US-3987109-A POLYMERIZATION OF POLYFUNCTIONAL PHENOLS UNIVERSAL OIL PRODUCTS COMPANY (US) 1976-10-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film PAH, POLR1A, CBR1 SELL 4483/4885SELP 2791/4885SELE 4213/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.