⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12836391 | 0.85 | — | — | |
| SCHEMBL108134 | 0.81 | — | — | |
| SCHEMBL16687971 | 0.81 | — | — | |
| SCHEMBL21339598 | 0.79 | — | — | |
| SCHEMBL23383199 | 0.77 | — | — | |
| SCHEMBL17087729 | 0.77 | — | — | |
| SCHEMBL17974537 | 0.77 | — | — | |
| SCHEMBL15219416 | 0.76 | — | — | |
| SCHEMBL2618644 | 0.76 | — | — | |
| SCHEMBL2618657 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10831102-B2 | Photoactive polymer brush materials and EUV patterning using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-11-10 | — | — | US | disclosed |
| WO-2019171188-A1 | PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-09-12 | — | — | WO | disclosed |
| US-20190271913-A1 | PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-09-05 | — | — | US | disclosed |