SCHEMBL14542974

SCHEMBL14542974

CCN=Nc1c(S(=O)(=O)O)cc2ccccc2c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 4/20 0.47
▸ CYP2C9 P11712 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ DNASE1L3 Q13609 1/20 0.47
▸ MPL P40238 7/20 0.47
▸ CTRC Q99895 2/20 0.47
▸ CTRB1 P17538 1/20 0.46
▸ PRMT3 O60678 1/20 0.46
▸ EP300 Q09472 1/20 0.46
▸ PRMT6 Q96LA8 1/20 0.46
▸ PRMT1 Q99873 1/20 0.46
▸ ALDH1A1 P00352 2/20 0.44
▸ HIF1A Q16665 1/20 0.44
▸ PHLPP2 Q6ZVD8 1/20 0.43
▸ ENPP2 Q13822 2/20 0.42
▸ MEN1 O00255 1/20 0.41
▸ THRB P10828 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ CA2 P00918 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9275771 0.86 CYP1A2 (0.43) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL9275764 0.86 CYP1A2 (0.43) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL6123674 0.85 CYP1A2 (0.45) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL13238842 0.84 MPL (0.50) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL13994930 0.84 MPL (0.50) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL23787644 0.83 CYP1A2 (0.47) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL13994851 0.81 MPL (0.50) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL13852025 0.81 MPL (0.50) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL12943030 0.80 PRMT3 (0.61) CYP1A2CYP2C9MAPK1DNASE1L3MPL
SCHEMBL23787643 0.80 PRMT3 (0.48) CYP1A2CYP2C9MAPK1DNASE1L3MPL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2007046553-A1 INK COMPOSITION, MANUFACTURING METHOD OF INK, INK SET, AND RECORDING METHOD FUJIFILM CORPORATION (JP) 2007-04-26 — — WO disclosed
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