Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | CASP1 | P29466 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL28923385 | 1.00 | CA1 (0.44) | CA1CA2CA9IDO1HCAR2 | |
| SCHEMBL5836815 | 0.88 | THRB (0.34) | CA1CA2CA9HCAR2NPC1 | |
| SCHEMBL2918971 | 0.87 | IDO1 (0.55) | IDO1NPC1RAB9AMEN1LMNA | |
| SCHEMBL7590883 | 0.85 | IDO1 (0.48) | IDO1LMNATDP1MAOAMAOB | |
| SCHEMBL12055099 | 0.84 | MEN1 (0.39) | CA1CA9ALDH1A1MEN1LMNA | |
| SCHEMBL11409221 | 0.83 | CA1 (0.41) | CA1CA2CA9IDO1HCAR2 | |
| SCHEMBL28886012 | 0.79 | MEN1 (0.33) | CA1CA2CA9IDO1HCAR2 | |
| SCHEMBL6781314 | 0.78 | ESR1 (0.52) | CA1CA2CA9IDO1ALDH1A1 | |
| SCHEMBL169595 | 0.78 | ALDH1A1 (0.46) | CA1CA9ALDH1A1MEN1LMNA | |
| SCHEMBL8052656 | 0.78 | CHKA (0.37) | CA1CA2CA9HCAR2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1307 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| CN-118307789-A | Resin microsphere for blood perfusion and preparation method and application thereof | 河南驼人医疗器械研究院有限公司 | 2024-07-09 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-10042087-B2 | Photosensitive resin composition and color filter using the same | SAMSUNG SDI CO., LTD. (KR) | 2018-08-07 | — | — | US | claimed |
| US-9164385-B2 | Photosensitive resin composition and light blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2015-10-20 | — | — | US | claimed |
| US-20150111156-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-04-23 | — | — | US | claimed |
| US-20150069310-A1 | Photosensitive Resin Composition and Color Filter Using the Same | SAMSUNG SDI CO., LTD. (KR) | 2015-03-12 | — | — | US | claimed |
| US-8426115-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | claimed |
| US-8298454-B2 | Photosensitive resin composition and light blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2012-10-30 | — | — | US | claimed |
| US-8273270-B2 | Photosensitive resin composition and light blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2012-09-25 | — | — | US | claimed |
| US-20120161087-A1 | Photosensitive Resin Composition and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2012-06-28 | — | — | US | claimed |
| US-20120145971-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2012-06-14 | — | — | US | claimed |
| US-20120091407-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2012-04-19 | — | — | US | claimed |
| US-20110033803-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | claimed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | claimed |
| EP-1476509-B1 | SELF-POLISHING ANTIFOULING PAINT | JOTUN AS (NO) | 2007-04-11 | — | — | EP | claimed |
| US-7060771-B2 | Transparent fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-06-13 | — | — | US | claimed |
| EP-4744901-A1 | ON-PRESS DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, PLANOGRAPHIC PRINTING METHOD, AND COMPOUND | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-3970606-A | N-vinyl lactam interpolymers useful as thickening agents | GAF CORPORATION (US) | 1976-07-20 | — | — | US | disclosed |
| US-3949136-A | OIL REPELLENTS, WATERPROOFING TEXTILES | CIBA-GEIGY AG (CH) | 1976-04-06 | — | — | US | disclosed |