Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 2/20 | 0.64 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.51 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8736276 | 0.85 | ALOX15 (0.75) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL30392817 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL27084023 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL17409526 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL8737981 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL8515562 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL18138231 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL1532502 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL18604009 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA | |
| Cedryl Acetate SCHEMBL17627733 | 0.79 | ALOX15 (1.00) | ALOX15CYP17A1CYP19A1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |