SCHEMBL8736276

SCHEMBL8736276

C=C(C)C(=O)OC1(C)CCC23CC1C(C)(C)C2CCC3C

nearest known ligand 0.75

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ ALOX15 P16050 2/20 0.75
▸ CYP17A1 P05093 3/20 0.55
▸ CYP19A1 P11511 3/20 0.55
▸ ALDH1A1 P00352 1/20 0.52
▸ LMNA P02545 1/20 0.52
▸ THRB P10828 1/20 0.52
▸ MAPK1 P28482 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cedryl Acetate SCHEMBL17627733 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL30392817 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL27084023 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL18604009 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL1532502 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL8515562 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL17409526 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL18138231 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
Cedryl Acetate SCHEMBL8737981 0.86 ALOX15 (1.00) ALOX15CYP17A1CYP19A1ALDH1A1LMNA
SCHEMBL14557137 0.85 ALOX15 (0.64) ALOX15CYP17A1CYP19A1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160209747-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2016-07-21 — — US disclosed
EP-1780224-B1 MULTIBRANCHED POLYMERS AND PROCESS FOR PRODUCTION THEREOF NIPPON SODA CO (JP) 2015-02-18 — — EP disclosed
US-8846290-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
EP-2186838-B1 METHOD FOR PRODUCING STAR POLYMER NIPPON SODA CO (JP) 2014-08-27 — — EP disclosed
US-8795944-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-08-05 — — US disclosed
US-8771916-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-07-08 — — US disclosed
US-8193286-B2 Acrylic star polymer NIPPON SODA CO., LTD. (JP) 2012-06-05 — — US disclosed
US-8193286-B2 Acrylic star polymer NIPPON SODA CO., LTD. (JP) 2012-06-05 — — US disclosed
US-20120129100-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-05-24 — — US disclosed
US-20120015302-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-19 — — US disclosed
US-7195856-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-03-27 — — US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 — — US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 — — US disclosed
US-7189492-B2 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-03-13 — — US disclosed
US-7189492-B2 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-03-13 — — US disclosed
US-7179578-B2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 — — US disclosed
US-7179578-B2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 — — US disclosed
US-7179579-B2 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 — — US disclosed
US-7179579-B2 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 — — US disclosed
EP-1752479-A1 ACRYLIC STAR POLYMER NIPPON SODA CO., LTD. (JP) 2007-02-14 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120129100-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME ACTR8, RAD51, ACTR2 ALOX15 2238/4885CYP17A1 4404/4885CYP19A1 4190/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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