SCHEMBL1458869

SCHEMBL1458869

Fc1ccc2cccc(F)c2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 2/20 0.52
CYP1A2 P05177 1/20 0.52
IDO1 P14902 1/20 0.46
HPRT1 P00492 1/20 0.43
MPI P34949 2/20 0.39
MAPK14 Q16539 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
ALDH1A1 P00352 4/20 0.38
NFE2L2 Q16236 2/20 0.38
HSD17B10 Q99714 2/20 0.38
TSHR P16473 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
TRPA1 O75762 1/20 0.38
HIF1A Q16665 1/20 0.37
CYP1B1 Q16678 1/20 0.37
KDM4E B2RXH2 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27923401 0.83 CYP1A2 (0.56) CYP2A6CYP1A2IDO1HPRT1MAPK14
SCHEMBL30854778 0.83 CYP1A2 (0.56) CYP2A6CYP1A2IDO1HPRT1MAPK14
SCHEMBL30366173 0.81 CYP1A2 (0.52) CYP2A6CYP1A2IDO1HPRT1MAPK14
SCHEMBL30366550 0.81 CYP1A2 (0.52) CYP2A6CYP1A2IDO1HPRT1MAPK14
SCHEMBL5748246 0.81 CYP1A2 (0.52) CYP2A6CYP1A2IDO1HPRT1MAPK14
SCHEMBL31257785 0.79 ALDH1A1 (0.43) CYP2A6CYP1A2HPRT1L3MBTL1ALDH1A1
SCHEMBL30377849 0.79 CYP1A2 (0.52) CYP2A6CYP1A2IDO1HPRT1ALDH1A1
SCHEMBL9040617 0.78 ALDH1A1 (0.64) CYP2A6CYP1A2HPRT1MAPK14L3MBTL1
SCHEMBL12189938 0.77 CYP2A6 (0.48) CYP2A6CYP1A2HPRT1L3MBTL1CASP3
SCHEMBL6552818 0.77 CTDSP1 (0.59) CYP2A6CYP1A2IDO1L3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
US-20240004296-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-01-04 US disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed
WO-2022107759-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2022-05-27 WO disclosed
EP-3564245-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR Osaka University (JP) 2019-11-06 EP disclosed
WO-2018123207-A1 NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR 国立大学法人大阪大学 2018-07-05 WO disclosed
WO-2011035355-A1 NOVEL ANTIMALARIAL 3-AZABICYCLO[3.2.2]NONANE DERIVATIVES UNIVERSITY OF GRAZ (AT) 2011-03-31 WO disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed