SCHEMBL30366173

SCHEMBL30366173

Fc1ccc2c(F)cccc2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.52
CYP2A6 P11509 1/20 0.52
IDO1 P14902 2/20 0.46
HSD17B1 P14061 3/20 0.40
HSD17B2 P37059 3/20 0.40
HPRT1 P00492 1/20 0.39
MAPK14 Q16539 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
NFE2L2 Q16236 3/20 0.38
ACHE P22303 2/20 0.36
CA3 P07451 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
CA5B Q9Y2D0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5748246 1.00 CYP1A2 (0.52) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL30366550 1.00 CYP1A2 (0.52) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL30854778 0.83 CYP1A2 (0.56) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL27923401 0.83 CYP1A2 (0.56) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL18530961 0.81 CYP1A2 (0.52) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL1458869 0.81 CYP2A6 (0.52) CYP1A2CYP2A6IDO1HPRT1MAPK14
SCHEMBL31257785 0.79 ALDH1A1 (0.43) CYP1A2CYP2A6HSD17B1HSD17B2HPRT1
SCHEMBL15351712 0.77 CYP1A2 (0.48) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL15352226 0.77 CYP1A2 (0.48) CYP1A2CYP2A6IDO1HSD17B1HSD17B2
SCHEMBL22554978 0.77 CYP1A2 (0.48) CYP1A2CYP2A6IDO1HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-116419937-A Composition for forming resist underlayer film 日产化学株式会社 2023-07-11 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed