SCHEMBL14589290

SCHEMBL14589290

CCn1c2ccccc2c2cc(/C=C3/OC(=S)N(CCc4ccc(OC)cc4)C3=O)ccc21

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
LMNA P02545 1/20 0.47
PTGER4 P35408 1/20 0.44
SRC P12931 2/20 0.42
SMPD1 P17405 3/20 0.42
MAPT P10636 4/20 0.41
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
HPGD P15428 2/20 0.41
HTT P42858 2/20 0.41
TP53 P04637 1/20 0.41
HSD17B3 P37058 6/20 0.41
KDM4E B2RXH2 3/20 0.41
PIK3CG P48736 1/20 0.40
NPSR1 Q6W5P4 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14589283 0.91 PTGER4 (0.45) ALDH1A1SMN1; SMN2LMNAPTGER4SRC
SCHEMBL14589362 0.91 KDM4E (0.43) ALDH1A1SMN1; SMN2LMNAPTGER4SRC
SCHEMBL14589308 0.86 SRC (0.42) ALDH1A1SMN1; SMN2LMNAPTGER4SRC
SCHEMBL12463869 0.85 KDM4E (0.50) ALDH1A1SMN1; SMN2LMNASRCMAPT
SCHEMBL14589317 0.84 ALDH1A1 (0.39) ALDH1A1SMN1; SMN2LMNAPTGER4MAPT
SCHEMBL14589298 0.83 ALDH1A1 (0.35) ALDH1A1SMN1; SMN2LMNAPTGER4MAPT
SCHEMBL12013794 0.81 KDM4E (0.50) ALDH1A1SMN1; SMN2LMNAPTGER4SRC
SCHEMBL14589302 0.80 MAPT (0.42) ALDH1A1SMN1; SMN2LMNASMPD1MAPT
SCHEMBL14589278 0.80 HSD17B3 (0.40) ALDH1A1SMN1; SMN2LMNASMPD1MAPT
SCHEMBL14110219 0.79 KDM4E (0.45) ALDH1A1SMN1; SMN2LMNASRCMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed