SCHEMBL145955

SCHEMBL145955

NCCC1=CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL146274 0.88
SCHEMBL16242856 0.88 MAOA (0.32)
SCHEMBL8505218 0.87 CYP19A1 (0.33)
SCHEMBL1978763 0.83 CYP19A1 (0.31)
SCHEMBL146825 0.83
SCHEMBL1955612 0.79 CYP19A1 (0.36)
SCHEMBL1979830 0.79
SCHEMBL146491 0.79
SCHEMBL1250812 0.76
SCHEMBL8431211 0.75 CYP19A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9647213-B2 Interlayer for electronic devices MERCK PATENT GMBH (DE) 2017-05-09 US disclosed
US-9647222-B2 Gate insulator layer for organic electronic devices MERCK PATENT GMBH (DE) 2017-05-09 US disclosed
US-9583713-B2 Interlayer for electronic devices MERCK PATENT GMBH (DE) 2017-02-28 US disclosed
EP-2676979-B1 Gate insulator layer for electronic devices MERCK PATENT GMBH (DE) 2016-07-13 EP disclosed
US-20150372246-A1 GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES FLEXENABLE TECHNOLOGY LIMITED (GB) 2015-12-24 US disclosed
US-20150349263-A1 INTERLAYER FOR ELECTRONIC DEVICES FLEXENABLE TECHNOLOGY LIMITED (GB) 2015-12-03 US disclosed
EP-2611842-B1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-11-04 EP disclosed
US-9175123-B2 Gate insulator layer for organic electronic devices MERCK PATENT GMBH (DE) 2015-11-03 US disclosed
EP-2611841-B1 GATE INSULATOR LAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-10-28 EP disclosed
EP-2676978-B1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-06-24 EP disclosed
US-20120056249-A1 INTERLAYER FOR ELECTRONIC DEVICES PROMERUS LLC (US) 2012-03-08 US disclosed
WO-2012028278-A1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2012-03-08 WO disclosed
WO-2012028279-A1 GATE INSULATOR LAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2012-03-08 WO disclosed
US-20120056183-A1 GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES PROMERUS LLC (US) 2012-03-08 US disclosed
US-8053515-B2 curable addition polymer having norbornene-type backbones, having oxidation resistance, used in microelectronic and optoelectronic applications PROMERUS LLC (US) 2011-11-08 US disclosed
EP-2102257-A1 DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF Promerus, LLC (US) 2009-09-23 EP disclosed
US-20080194740-A1 DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF SUMITOMO BAKELITE CO., LTD. (JP) 2008-08-14 US disclosed
WO-2008070774-A1 DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF PROMERUS LLC (US) 2008-06-12 WO disclosed
WO-2008014313-A2 A PROCESS FOR FORMING PERFLUORINATED-ALKYL SULFONAMIDE SUBSTITUTED NORBORNENE-TYPE MONOMERS PROMERUS LLC (US) 2008-01-31 WO disclosed
US-20080027246-A1 Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers PROMERUS, LLC 2008-01-31 US disclosed