Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14616375 | 0.87 | CYP3A4 (0.36) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL47528 | 0.81 | CYP3A4 (0.42) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14787816 | 0.80 | CYP3A4 (0.48) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14617370 | 0.78 | CYP3A4 (0.33) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14789978 | 0.74 | CYP3A4 (0.34) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL17424234 | 0.74 | CYP3A4 (0.40) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL17424499 | 0.73 | CYP3A4 (0.39) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14616353 | 0.73 | CYP3A4 (0.33) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL18898007 | 0.72 | CYP3A4 (0.41) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14616354 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999630-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8822136-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8790866-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |