SCHEMBL14616375

SCHEMBL14616375

CCC(C)(C)C(=O)OC1COC2C(OCOC3C4(C)CCC(C4)C3(C)C)COC12

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
BCHE P06276 2/20 0.33
GPR84 Q9NQS5 1/20 0.33
KLK7 P49862 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14617370 0.90 CYP3A4 (0.33) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14616376 0.87 CYP3A4 (0.38) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14789978 0.85 CYP3A4 (0.34) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14616353 0.84 CYP3A4 (0.33) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14616402 0.82 BCHE (0.36) BCHEKLK7
SCHEMBL14616382 0.82 CYP3A4 (0.37) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14617347 0.82 CYP3A4 (0.37) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14617328 0.82 CYP3A4 (0.37) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL15043154 0.81 CYP3A4 (0.36) CYP3A4CYP2D6CYP2C9CYP2C19TDP1
SCHEMBL14616381 0.80 GPR84 (0.35) CYP3A4CYP2D6CYP2C9CYP2C19TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999630-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-07 US disclosed
US-8822136-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-02 US disclosed
US-8795946-B2 Polymerizable ester compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-8795946-B2 Polymerizable ester compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-20130130177-A1 NEGATIVE PATTERN FORMING PROCESS AND NEGATIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-23 US disclosed
US-20130108960-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed
US-20130065183-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-14 US disclosed
US-20130017492-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017484-A1 POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130017484-A1 POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS RER1, DOT1L, H1-0 CYP3A4 1468/4885CYP2D6 3193/4885CYP2C9 2207/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.