Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 2/20 | 0.33 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14617328 | 1.00 | CYP3A4 (0.37) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14617347 | 1.00 | CYP3A4 (0.37) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL15043154 | 0.82 | CYP3A4 (0.36) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14616375 | 0.82 | CYP3A4 (0.36) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14616381 | 0.81 | GPR84 (0.35) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14617327 | 0.81 | GPR84 (0.35) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL3692737 | 0.79 | CYP3A4 (0.43) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL13445840 | 0.79 | CYP3A4 (0.43) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL14617370 | 0.77 | CYP3A4 (0.33) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 | |
| SCHEMBL4941894 | 0.76 | CYP3A4 (0.50) | CYP3A4CYP2D6CYP2C9CYP2C19TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999630-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8999630-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |