SCHEMBL14616637

SCHEMBL14616637

O=S(=O)(O)CCOC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.39
NPSR1 Q6W5P4 3/20 0.39
MEN1 O00255 2/20 0.39
HTT P42858 2/20 0.39
KMT2A Q03164 2/20 0.39
SMN1; SMN2 Q16637 6/20 0.38
TSHR P16473 2/20 0.38
LMNA P02545 5/20 0.38
MAPK1 P28482 2/20 0.38
KDM4E B2RXH2 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
GAA P10253 2/20 0.33
MMP2 P08253 1/20 0.33
MMP9 P14780 1/20 0.33
SCN9A Q15858 1/20 0.33
EPHX2 P34913 2/20 0.31
CYP19A1 P11511 1/20 0.31
ATM Q13315 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5097437 0.81 SMN1; SMN2 (0.38) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL18775799 0.78 CYP19A1 (0.36) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL19135828 0.74
SCHEMBL14616638 0.74 SMN1; SMN2 (0.42) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL15999320 0.74 ALDH1A1 (0.35) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL21968037 0.73 EPHX2 (0.50) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL98471 0.73 ALDH1A1 (0.47) ALDH1A1NPSR1MEN1KMT2ALMNA
SCHEMBL4389244 0.73 ALDH1A1 (0.41) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL4389248 0.73 ALDH1A1 (0.41) ALDH1A1NPSR1MEN1HTTKMT2A
SCHEMBL1499943 0.71 HTT (0.44) ALDH1A1NPSR1MEN1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed