SCHEMBL14616638

SCHEMBL14616638

CS(=O)(=O)NS(=O)(=O)CCOC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 6/20 0.42
TSHR P16473 2/20 0.42
ALDH1A1 P00352 8/20 0.38
LMNA P02545 5/20 0.38
KDM4E B2RXH2 2/20 0.38
NPSR1 Q6W5P4 3/20 0.38
MEN1 O00255 2/20 0.38
HTT P42858 2/20 0.38
KMT2A Q03164 2/20 0.38
SCN9A Q15858 1/20 0.37
MAPK1 P28482 2/20 0.34
MMP2 P08253 1/20 0.33
MMP9 P14780 1/20 0.33
CYP1A2 P05177 2/20 0.33
CYP2C9 P11712 2/20 0.33
CYP2C19 P33261 2/20 0.33
EPHX2 P34913 2/20 0.33
CYP3A4 P08684 1/20 0.32
GLA P06280 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19798441 0.74 EPHX2 (0.49) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL5097437 0.74 SMN1; SMN2 (0.38) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL14616637 0.74 ALDH1A1 (0.39) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL12959346 0.71 SCN9A (0.33) SMN1; SMN2TSHRNPSR1SCN9A
SCHEMBL14616636 0.70 NPSR1 (0.38) SMN1; SMN2TSHRLMNANPSR1SCN9A
SCHEMBL19798442 0.70 SMN1; SMN2 (0.44) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL15532690 0.69 SMN1; SMN2 (0.40) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL21996771 0.69 SMN1; SMN2 (0.40) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL15532287 0.69 SMN1; SMN2 (0.40) SMN1; SMN2TSHRALDH1A1LMNAKDM4E
SCHEMBL15532609 0.69 SMN1; SMN2 (0.40) SMN1; SMN2TSHRALDH1A1LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed