SCHEMBL14616646

SCHEMBL14616646

CS(=O)(=O)NS(=O)(=O)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.36
CA12 O43570 2/20 0.36
CA7 P43166 2/20 0.36
CA14 Q9ULX7 2/20 0.36
BRD4 O60885 5/20 0.36
CA2 P00918 1/20 0.33
BRPF1 P55201 1/20 0.33
PGAM1 P18669 1/20 0.33
MMP1 P03956 1/20 0.33
MMP7 P09237 1/20 0.33
MMP12 P39900 1/20 0.33
ECE1 P42892 1/20 0.33
MMP13 P45452 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CA9 Q16790 1/20 0.32
POLB P06746 1/20 0.31
LMNA P02545 1/20 0.30
TBXA2R P21731 1/20 0.30
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24361300 0.87 CA2 (0.32) CA2
SCHEMBL17322191 0.85 CA1 (0.42) CA1CA12CA7CA14BRD4
SCHEMBL21943789 0.75 CA1 (0.39) CA1CA12CA7CA14BRD4
SCHEMBL12033882 0.75 CA1 (0.39) CA1CA12CA7CA14BRD4
SCHEMBL2223819 0.72 CA1 (0.35) CA1CA12CA7CA14CA2
SCHEMBL2223826 0.72 CA1 (0.35) CA1CA12CA7CA14BRD4
SCHEMBL17540485 0.71 CA1 (0.36) CA1CA12CA7CA14BRD4
SCHEMBL10211278 0.71 PTGS1 (0.35) CA1CA12CA7CA14CA2
SCHEMBL780033 0.71 CA1 (0.38) CA1CA12CA7CA14BRD4
SCHEMBL20170489 0.71 CA1 (0.38) CA1CA12CA7CA14BRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9207390-B2 Light guide structures and display devices EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2015-12-08 US disclosed
US-9164225-B2 2015-10-20 US disclosed
US-20140192559-A1 LIGHT GUIDE STRUCTURES AND DISPLAY DEVICES EMPIRE TECHNOLOGY DEVELOPMENT LLC (DE) 2014-07-10 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed