SCHEMBL17322191

SCHEMBL17322191

O=S(=O)(NS(=O)(=O)C1CCCCC1)C1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.42
CA12 O43570 2/20 0.42
CA7 P43166 2/20 0.42
CA14 Q9ULX7 2/20 0.42
CA2 P00918 2/20 0.39
CA9 Q16790 1/20 0.37
EPHX2 P34913 2/20 0.33
BRD4 O60885 2/20 0.33
TBXA2R P21731 1/20 0.33
BRPF1 P55201 1/20 0.33
PGAM1 P18669 1/20 0.33
MMP1 P03956 1/20 0.33
MMP7 P09237 1/20 0.33
MMP12 P39900 1/20 0.33
ECE1 P42892 1/20 0.33
MMP13 P45452 1/20 0.33
ALDH1A1 P00352 2/20 0.32
HSD17B10 Q99714 1/20 0.32
EPHX1 P07099 5/20 0.31
NPC1 O15118 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14616646 0.85 CA1 (0.36) CA1CA12CA7CA14CA2
SCHEMBL2223819 0.80 CA1 (0.35) CA1CA12CA7CA14CA2
SCHEMBL10211278 0.79 PTGS1 (0.35) CA1CA12CA7CA14CA2
SCHEMBL5442008 0.78 CA1 (0.41) CA1CA12CA7CA14CA2
SCHEMBL21427076 0.78 CA1 (0.39) CA1CA12CA7CA14CA2
SCHEMBL8224007 0.78 CA1 (0.39) CA1CA12CA7CA14CA2
SCHEMBL21943789 0.78 CA1 (0.39) CA1CA12CA7CA14CA2
SCHEMBL22169646 0.78 CA1 (0.39) CA1CA12CA7CA14CA2
SCHEMBL13683211 0.78 CA1 (0.39) CA1CA12CA7CA14CA2
SCHEMBL12033882 0.78 CA1 (0.39) CA1CA12CA7CA14CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230132653-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20230132653-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-9899670-B2 Secondary battery-use active material, secondary battery-use electrode, secondary battery, battery pack, electric vehicle, electric power storage system, electric power tool, and electronic apparatus MURATA MANUFACTURING CO., LTD. (JP) 2018-02-20 US disclosed
US-9899670-B2 Secondary battery-use active material, secondary battery-use electrode, secondary battery, battery pack, electric vehicle, electric power storage system, electric power tool, and electronic apparatus MURATA MANUFACTURING CO., LTD. (JP) 2018-02-20 US disclosed
US-20150357636-A1 SECONDARY BATTERY-USE ACTIVE MATERIAL, SECONDARY BATTERY-USE ELECTRODE, SECONDARY BATTERY, BATTERY PACK, ELECTRIC VEHICLE, ELECTRIC POWER STORAGE SYSTEM, ELECTRIC POWER TOOL, AND ELECTRONIC APPARATUS SONY CORPORATION (JP) 2015-12-10 US disclosed
US-20150357636-A1 SECONDARY BATTERY-USE ACTIVE MATERIAL, SECONDARY BATTERY-USE ELECTRODE, SECONDARY BATTERY, BATTERY PACK, ELECTRIC VEHICLE, ELECTRIC POWER STORAGE SYSTEM, ELECTRIC POWER TOOL, AND ELECTRONIC APPARATUS SONY CORPORATION (JP) 2015-12-10 US disclosed