SCHEMBL14616647

SCHEMBL14616647

COCCS(=O)(=O)NS(C)(=O)=O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.35
TSHR P16473 1/20 0.35
PARP14 Q460N5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25834190 0.87 CA2 (0.39)
SCHEMBL10759640 0.79 USP2 (0.33) USP2TSHRPARP14
SCHEMBL25834188 0.77 ALDH1A1 (0.32) TSHR
SCHEMBL13902815 0.75
SCHEMBL25834192 0.74 ALDH1A1 (0.33) TSHR
SCHEMBL25834195 0.74 TSHR (0.40) TSHR
SCHEMBL15797986 0.73
SCHEMBL6698147 0.72 CA1 (0.32)
SCHEMBL22950990 0.71 ALDH1A1 (0.33) PARP14
SCHEMBL171773 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed