Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 6/20 | 0.56 |
| ▸ | FABP3 | P05413 | 2/20 | 0.56 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.56 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.40 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.37 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | F10 | P00742 | 1/20 | 0.36 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.36 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.35 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21922801 | 0.90 | FABP4 (0.62) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL10452159 | 0.85 | FABP4 (0.60) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL21943909 | 0.82 | FABP4 (0.40) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL21923046 | 0.80 | FABP4 (0.50) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL1767682 | 0.79 | FABP4 (0.63) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL675038 | 0.79 | FABP4 (0.58) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL21923051 | 0.78 | FABP4 (0.49) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL8243105 | 0.78 | FABP4 (0.67) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL21923054 | 0.77 | FABP3 (0.47) | FABP4FABP3FABP5GAAHDAC1 | |
| SCHEMBL27434290 | 0.76 | FABP4 (0.55) | FABP4FABP3FABP5GAAHDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3644122-B1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3644122-A1 | ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-04-29 | — | — | EP | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |