SCHEMBL14616990

SCHEMBL14616990

CC1CCCC(C)N1C(=O)OCc1ccc2ccccc2c1[N+](=O)[O-]

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NCEH1 Q6PIU2 1/20 0.41
TSHR P16473 1/20 0.40
HTR2C P28335 1/20 0.40
ALDH1A1 P00352 4/20 0.38
POLB P06746 1/20 0.38
HPGD P15428 2/20 0.38
GLA P06280 1/20 0.38
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
EPHX1 P07099 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
GAA P10253 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.35
CYP3A4 P08684 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17763408 0.81 ALDH1A1 (0.45) HTR2CALDH1A1POLBHPGDGLA
SCHEMBL1357399 0.79 ALDH1A1 (0.48) HTR2CALDH1A1POLBHPGDMEN1
SCHEMBL15964855 0.74 ALDH1A1 (0.43) HTR2CALDH1A1POLBHPGDMEN1
SCHEMBL14962142 0.73 ALDH1A1 (0.44) HTR2CALDH1A1POLBHPGDMEN1
SCHEMBL1358024 0.73 ALDH1A1 (0.52) TSHRHTR2CALDH1A1POLBHPGD
SCHEMBL13298530 0.72 POLB (0.46) ALDH1A1POLBHPGDMEN1KMT2A
SCHEMBL1357965 0.72 ALDH1A1 (0.46) TSHRALDH1A1POLBHPGDMEN1
SCHEMBL10360681 0.72 ALDH1A1 (0.45) TSHRHTR2CALDH1A1POLBHPGD
SCHEMBL4431805 0.71 HTR2C (0.72) TSHRHTR2CALDH1A1POLBHPGD
SCHEMBL1357412 0.70 ALDH1A1 (0.53) ALDH1A1POLBNPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9494866-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-11-15 US disclosed
US-9411224-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-09 US disclosed
US-9411224-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-09 US disclosed
US-9405200-B2 Resist composition and method of forming resist pattern TOYKO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-9405200-B2 Resist composition and method of forming resist pattern TOYKO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-9377685-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-28 US disclosed
US-9377685-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-28 US disclosed
US-20150147702-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2015-05-28 US disclosed
US-20150147702-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2015-05-28 US disclosed
US-9029070-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD (JP) 2015-05-12 US disclosed
US-20130137047-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137047-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-20130115555-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-09 US disclosed
US-20130115555-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-09 US disclosed
US-20130084523-A1 RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084523-A1 RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-04 US disclosed
US-20130078572-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-28 US disclosed
US-20130078572-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-28 US disclosed
US-20130017500-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017500-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-01-17 US disclosed