Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 1/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL77922 | 0.81 | ALDH1A1 (0.62) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL14627355 | 0.80 | TDP1 (0.45) | ALDH1A1TSHRHTTHPGDNPC1 | |
| SCHEMBL28046747 | 0.78 | CYP1A2 (0.54) | ALDH1A1TSHRHPGDKDM4EGAA | |
| SCHEMBL18033994 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL8723683 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL23091898 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL291637 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL22590899 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL12006800 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB | |
| SCHEMBL1520430 | 0.78 | ALDH1A1 (0.58) | ALDH1A1TSHRHTTHPGDMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106610566-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-105404096-B | Chemically amplified positive resist dry film, dry film laminate and method for producing laminate | 信越化学工业株式会社 | 2021-07-16 | — | — | CN | disclosed |
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |
| CN-108459469-A | Pattern forming method | 信越化学工业株式会社 | 2018-08-28 | — | — | CN | disclosed |
| CN-106610566-A | Chemically amplified positive resist composition and patterning process | 信越化学工业株式会社 | 2017-05-03 | — | — | CN | disclosed |
| CN-106200268-A | PATTERN FORMING METHOD AND RESIST COMPOSITION | 富士胶片株式会社 | 2016-12-07 | — | — | CN | disclosed |
| EP-1905608-B2 | Ink jet recording method and ink jet recording device | FUJIFILM CORP (JP) | 2016-11-23 | — | — | EP | disclosed |
| CN-103562795-B | Pattern formation method, sensitized ray or radiation-sensitive resin composition and resist film | 富士胶片株式会社 | 2016-08-31 | — | — | CN | disclosed |
| CN-103229102-B | Method for forming negative pattern, Resist patterns, electronic component and manufacture method thereof | FUJIFILM CORP. (JP) | 2016-04-13 | — | — | CN | disclosed |
| CN-102844710-B | Negative pattern forming method, negative resist composition and resist pattern | FUJIFILM CORP. (JP) | 2016-01-27 | — | — | CN | disclosed |
| CN-102812400-B | Resin composition and pattern forming method using the same | FUJIFILM CORP. (JP) | 2015-07-29 | — | — | CN | disclosed |
| EP-1955858-B1 | Ink-jet recording method and device | FUJIFILM CORP (JP) | 2014-06-18 | — | — | EP | disclosed |
| CN-103562795-A | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORP | 2014-02-05 | — | — | CN | disclosed |
| EP-1905610-B1 | Ink jet recording method and device | FUJIFILM CORP (JP) | 2013-10-16 | — | — | EP | disclosed |
| CN-103229102-A | Negative pattern forming method and resist pattern | FUJI PHOTO FILM CO LTD | 2013-07-31 | — | — | CN | disclosed |
| CN-1977189-A | Microlens | OMRON TATEISI ELECTRONICS CO (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-7169697-B2 | Semiconductor device and manufacturing method of the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070003862-A1 | Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof | FUJITSU LIMITED (JP) | 2007-01-04 | — | — | US | disclosed |