SCHEMBL28046747

SCHEMBL28046747

O=[N+]([O-])c1ccc(CO[SH](=O)=O)c([N+](=O)[O-])c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.54
TDP1 Q9NUW8 2/20 0.47
ALDH1A1 P00352 6/20 0.46
GPR35 Q9HC97 2/20 0.46
MAPK1 P28482 2/20 0.46
HIF1A Q16665 2/20 0.46
TP53 P04637 1/20 0.46
HPGD P15428 1/20 0.46
TSHR P16473 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
TXNRD1 Q16881 1/20 0.45
TXNRD3 Q86VQ6 1/20 0.45
TXNRD2 Q9NNW7 1/20 0.45
MAPT P10636 4/20 0.42
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
KDM4E B2RXH2 2/20 0.42
ALOX5 P09917 1/20 0.41
HSPB1 P04792 3/20 0.40
GAA P10253 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4943689 0.83 CYP1A2 (0.60) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL28530574 0.80 CYP1A2 (0.57) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL27800545 0.80 CYP1A2 (0.57) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL27961047 0.79 CYP1A2 (0.68) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL14627353 0.78 ALDH1A1 (0.55) TDP1ALDH1A1MAPK1HPGDTSHR
SCHEMBL95714 0.77 CYP1A2 (0.54) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL95713 0.77 CYP1A2 (0.54) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL5333075 0.77 CYP1A2 (0.66) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL10403856 0.76 CYP1A2 (0.60) CYP1A2TDP1ALDH1A1GPR35MAPK1
SCHEMBL10403857 0.76 CYP1A2 (0.65) CYP1A2TDP1ALDH1A1GPR35MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106610566-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2021-10-08 CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN disclosed
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 CN disclosed
CN-108459469-A Pattern forming method 信越化学工业株式会社 2018-08-28 CN disclosed
CN-106610566-A Chemically amplified positive resist composition and patterning process 信越化学工业株式会社 2017-05-03 CN disclosed
CN-105404096-A CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE SHINETSU CHEMICAL CO 2016-03-16 CN disclosed
CN-105301905-A Chemically amplified positive resist composition and patterning process SHINETSU CHEMICAL CO 2016-02-03 CN disclosed