⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4229164 | 0.77 | — | — | |
| SCHEMBL12728877 | 0.74 | — | — | |
| SCHEMBL4766709 | 0.72 | — | — | |
| SCHEMBL15299018 | 0.72 | — | — | |
| SCHEMBL14085802 | 0.72 | — | — | |
| SCHEMBL14668867 | 0.70 | THRB (0.36) | — | |
| SCHEMBL19493485 | 0.69 | — | — | |
| SCHEMBL18699177 | 0.67 | TDP1 (0.31) | — | |
| SCHEMBL703581 | 0.67 | — | — | |
| SCHEMBL4400734 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-8822129-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| EP-2503393-B1 | Method for preparation of lithographic printing plate | FUJIFILM CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-20130084438-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20120295204-A1 | PROCESSING METHOD OF LITHOGRAPHIC PRINTING PLATE PREURSOR | FUJIFILM CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |