⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4229164 | 0.77 | — | — | |
| SCHEMBL12728877 | 0.74 | — | — | |
| SCHEMBL704053 | 0.74 | — | — | |
| SCHEMBL22534476 | 0.74 | RIPK1 (0.30) | — | |
| SCHEMBL15299018 | 0.72 | — | — | |
| SCHEMBL14085802 | 0.72 | — | — | |
| SCHEMBL14642913 | 0.72 | — | — | |
| SCHEMBL4764606 | 0.71 | — | — | |
| SCHEMBL14668867 | 0.70 | THRB (0.36) | — | |
| SCHEMBL704255 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024109453-A1 | PURIFICATION METHOD FOR ALKOXY SILANE COMPOSITION | 江苏南大光电材料股份有限公司 | 2024-05-30 | — | — | WO | disclosed |
| CN-115490719-B | Method for purifying alkoxysilane composition | 江苏南大光电材料股份有限公司 | 2023-05-02 | — | — | CN | disclosed |
| CN-115490719-A | Purification method of alkoxy silane composition | 江苏南大光电材料股份有限公司 | 2022-12-20 | — | — | CN | disclosed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | disclosed |
| CN-109641482-B | Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues | 株式会社普利司通 | 2021-11-05 | — | — | CN | disclosed |
| EP-1832351-B1 | Low dielectric materials and methods for making same | AIR PROD & CHEM (US) | 2008-11-12 | — | — | EP | disclosed |
| US-20080207864-A1 | Organosilanes, Process For Production of the Same, and Use Thereof | SHARP KABUSHIKI KAISHA (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1837086-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-26 | — | — | EP | disclosed |
| EP-1832351-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-12 | — | — | EP | disclosed |
| US-20050260420-A1 | Low dielectric materials and methods for making same | VERSUM MATERIALS US, LLC | 2005-11-24 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| US-5624680-A | SKIN ABSORPTION OF DRUGS WITH POLYETHERSILOXANE BLOCK COPOLYMERS | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1997-04-29 | — | — | US | disclosed |
| EP-0710688-A1 | HYDROXYSILYL-TERMINATED POLYOXYETHYLENE COMPOUND, QUATERNARY-SALT-TERMINATED BLOCK COPOLYMER, AND PERCUTANEOUS ABSORPTION PROMOTER | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1996-05-08 | — | — | EP | disclosed |