Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 11/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 11/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 9/20 | 0.33 |
| ▸ | MLNR | O43193 | 1/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2447937 | 0.81 | SLC6A2 (0.33) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL27482673 | 0.79 | KEAP1 (0.48) | — | |
| SCHEMBL23929455 | 0.77 | — | — | |
| SCHEMBL3128374 | 0.77 | SLC6A2 (0.35) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL3309545 | 0.77 | SLC6A2 (0.35) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL87430 | 0.77 | SLC6A2 (0.33) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL3307552 | 0.75 | SLC6A2 (0.36) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL3306685 | 0.74 | SLC6A2 (0.37) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL3303637 | 0.74 | SLC6A2 (0.35) | SLC6A2SLC6A4SLC6A3MLNRADRB2 | |
| SCHEMBL185652 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2021 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240238181-A1 | DEODORANTS COMPRISING ALKYLAMIDO AND ALKENYLAMIDO-MORPHOLINIUM COMPOSITIONS | COLONIAL CHEMICAL, INC. | 2024-07-18 | — | — | US | claimed |
| EP-4281033-A1 | DEODORANTS COMPRISING ALKYLAMIDO AND ALKENYLAMIDO-MORPHOLINIUM COMPOSITIONS | Colonial Chemical, Inc. (US) | 2023-11-29 | — | — | EP | claimed |
| CN-107880545-B | Resin composition, method for producing cured product, and cured product | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | claimed |
| EP-3555246-B1 | MULTI-FUNCTIONAL OLEFIN COPOLYMERS AND LUBRICATING COMPOSITIONS CONTAINING SAME | AFTON CHEMICAL CORP (US) | 2020-11-25 | — | — | EP | claimed |
| EP-3555246-A1 | MULTI-FUNCTIONAL OLEFIN COPOLYMERS AND LUBRICATING COMPOSITIONS CONTAINING SAME | Afton Chemical Corporation (US) | 2019-10-23 | — | — | EP | claimed |
| CN-110191942-A | Multi-functional olefin copolymer and lubricating composition containing it | 雅富顿化学公司 | 2019-08-30 | — | — | CN | claimed |
| US-20180171258-A1 | Multi-Functional Olefin Copolymers and Lubricating Compositions Containing Same | AFTON CHEMICAL CORPORATION (US) | 2018-06-21 | — | — | US | claimed |
| WO-2018111726-A1 | MULTI-FUNCTIONAL OLEFIN COPOLYMERS AND LUBRICATING COMPOSITIONS CONTAINING SAME | AFTON CHEMICAL CORPORATION (US) | 2018-06-21 | — | — | WO | claimed |
| US-9851636-B2 | Materials and methods for improved photoresist performance | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-12-26 | — | — | US | claimed |
| EP-1627259-B1 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PROD & CHEM (US) | 2015-07-01 | — | — | EP | claimed |
| US-20040234904-A1 | Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof | VERSUM MATERIALS US, LLC | 2004-11-25 | — | — | US | claimed |
| US-6699635-B1 | SUITABLE FOR THE CASES WHEREIN FAR ULTRAVIOLET RAYS HAVING WAVELENGTHS OF 250 NM OR SHORTER ARE USED AS EXPOSURE LIGHT | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-02 | — | — | US | claimed |
| US-6673512-B1 | PHOTORESISTS COMPRISING HOMO(CO)POLYCARBONS, ACID GENERATORS, CURING AGENTS AND BASES, USED TO FORM MINIATURIZED PATTERNS ON SEMICONDUCTORS USING X-RAYS OR RADIATION BEAMS; HIGH SENSITIVITY AND RESOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-06 | — | — | US | claimed |
| US-6548458-B2 | Prepared by reaction of hydrocarbyl-substituted succinic acylating agents with alpha-omega amino acids; pendant carboxylic acid moieties can be reacted with amines, alkoxylated amines and polyols; fuel additives | ETHYL CORPORATION | 2003-04-15 | — | — | US | claimed |
| US-20020091068-A1 | Succinimide-acid compounds and derivatives thereof | AFTON CHEMICAL INTANGIBLES LLC | 2002-07-11 | — | — | US | claimed |
| CN-1322712-A | Succinimide-acid compound and its derivative | ETHYL CORP (US) | 2001-11-21 | — | — | CN | claimed |
| EP-1151994-A1 | Succinimide-acid compounds and derivatives thereof | ETHYL CORPORATION (US) | 2001-11-07 | — | — | EP | claimed |
| US-6111056-A | Cyclic amine based polymers and process for their production | BASF AKTIENGESELLSCHAFT (DE) | 2000-08-29 | — | — | US | claimed |
| US-5484462-A | AMINOALKYL MORPHOLINE ADDITIVE | TEXACO INC. (US) | 1996-01-16 | — | — | US | claimed |
| US-4866135-A | ADDUCT WITH ALPHA-OLEFIN COPOLYMER GRAFTED WITH UNSATURATED CARBOXYLIC UNITS | EXXON CHEMICAL PATENTS INC. (US) | 1989-09-12 | — | — | US | claimed |