SCHEMBL14655656

SCHEMBL14655656

C=CCOCC(O)COc1c2ccccc2c(OCC(O)COCC=C)c2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.47
CA2 P00918 4/20 0.47
CA7 P43166 4/20 0.47
CYP2D6 P10635 4/20 0.43
LMNA P02545 4/20 0.43
ADRB2 P07550 4/20 0.43
ADRB1 P08588 4/20 0.43
CYP1A2 P05177 3/20 0.43
HTR1A P08908 2/20 0.43
SLC6A4 P31645 2/20 0.43
ADRA1A P35348 2/20 0.43
SLC22A1 O15245 1/20 0.43
HTR2A P28223 1/20 0.43
CA4 P22748 3/20 0.40
CA9 Q16790 3/20 0.40
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
GAA P10253 2/20 0.38
MAPT P10636 2/20 0.38
HTT P42858 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11950503 0.82 CYP2D6 (0.49) CA1CA2CA7CYP2D6LMNA
SCHEMBL7809097 0.82 CYP2D6 (0.49) CA1CA2CA7CYP2D6LMNA
SCHEMBL14411018 0.78 LMNA (0.49) CYP2D6LMNAADRB2ADRB1CYP1A2
SCHEMBL497334 0.76 CA1 (0.74) CA1CA2CA7CYP2D6LMNA
SCHEMBL9066767 0.76 ALDH1A1 (0.65) CYP2D6LMNAADRB2ADRB1CYP1A2
SCHEMBL1566002 0.75 CA1 (0.60) CA1CA2CA7CYP2D6CYP1A2
SCHEMBL18653600 0.75 CA1 (0.60) CA1CA2CA7CYP2D6CYP1A2
SCHEMBL11216795 0.75 CA1 (0.45) CA1CA2CA7CYP2D6LMNA
SCHEMBL5675273 0.74 CA12 (0.46) CA1CA2CA7CYP2D6LMNA
SCHEMBL7160070 0.74 CA1 (0.71) CA1CA2CA7CYP2D6LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10731062-B2 Gas-generating material and micropump SEKISUI CHEMICAL CO., LTD. (JP) 2020-08-04 US disclosed
EP-2860167-B1 GAS GENERATING MATERIAL, AND MICROPUMP SEKISUI CHEMICAL CO LTD (JP) 2020-04-29 EP disclosed
EP-2907798-B1 GAS-GENERATING MATERIAL AND MICROPUMP SEKISUI CHEMICAL CO LTD (JP) 2019-02-06 EP disclosed
US-9855734-B2 Wafer processing method SEKISUI CHEMICAL CO., LTD. (JP) 2018-01-02 US disclosed
US-20150232714-A1 GAS-GENERATING MATERIAL AND MICROPUMP SEKISUI CHEMICAL CO., LTD. (JP) 2015-08-20 US disclosed
EP-2907798-A1 GAS-GENERATING MATERIAL AND MICROPUMP Sekisui Chemical Co., Ltd. (JP) 2015-08-19 EP disclosed
US-20150217552-A1 WAFER PROCESSING METHOD SEKISUI CHEMICAL CO., LTD. (JP) 2015-08-06 US disclosed
EP-2860167-A1 GAS GENERATING MATERIAL, AND MICROPUMP Sekisui Chemical Co., Ltd. (JP) 2015-04-15 EP disclosed
US-8986630-B2 Gas-generating material and micro pump SEKISUI CHEMICAL CO., LTD. (JP) 2015-03-24 US disclosed
US-20140161687-A1 GAS-GENERATING MATERIAL AND MICRO PUMP SEKISUI CHEMICAL CO., LTD. (JP) 2014-06-12 US disclosed
US-20130071658-A1 ADHESIVE COMPOSITION, ADHESIVE TAPE, METHOD FOR PROCESSING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING TSV WAFER SEKISUI CHEMICAL CO., LTD. (JP) 2013-03-21 US disclosed
EP-2551323-A1 ADHESIVE COMPOSITION, ADHESIVE TAPE, METHOD FOR PROCESSING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING TSV WAFER Sekisui Chemical Co., Ltd. (JP) 2013-01-30 EP disclosed