SCHEMBL14658384

SCHEMBL14658384

CN(C)[Hf](c1cc(C(C)(C)C)[nH]c1C(C)(C)C)(c1cc(C(C)(C)C)[nH]c1C(C)(C)C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14659169 0.89 — —
SCHEMBL27459301 0.66 DAO (0.32) —
SCHEMBL1791619 0.66 ALDH1A1 (0.38) —
SCHEMBL4011812 0.66 DAO (0.32) —
SCHEMBL14658009 0.65 — —
SCHEMBL14659667 0.65 ABCC9 (0.30) —
SCHEMBL19323695 0.64 MAPK14 (0.32) —
SCHEMBL1924912 0.64 DAO (0.31) —
SCHEMBL1794431 0.64 ALDH1A1 (0.37) —
SCHEMBL14658346 0.63 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130030191-A1 Group IV Metal Complexes For Metal-Containing Film Deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-01-31 — — US claimed
US-20130030191-A1 Group IV Metal Complexes For Metal-Containing Film Deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-01-31 — — US disclosed
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