SCHEMBL14667606

SCHEMBL14667606

CC(Cc1ccc(-c2ccccc2)cc1)OCC1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ MME P08473 4/20 0.45
▸ ACE P12821 4/20 0.45
▸ CPA1 P15085 4/20 0.45
▸ ACE2 Q9BYF1 4/20 0.45
▸ SIGMAR1 Q99720 1/20 0.41
▸ NAAA Q02083 1/20 0.41
▸ EPHX1 P07099 1/20 0.40
▸ ITGB1 P05556 2/20 0.39
▸ ITGA4 P13612 2/20 0.39
▸ MEN1 O00255 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ SRR Q9GZT4 1/20 0.37
▸ PSAT1 Q9Y617 1/20 0.37
▸ SLC6A2 P23975 1/20 0.37
▸ SLC6A4 P31645 1/20 0.37
▸ SLC6A3 Q01959 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14667576 0.91 SIGMAR1 (0.45) SIGMAR1MEN1KMT2ASLC6A2SLC6A4
SCHEMBL14118687 0.76 SIGMAR1 (0.43) SIGMAR1SLC6A2SLC6A4SLC6A3
SCHEMBL8818998 0.75 MME (0.51) MMEACECPA1ACE2SIGMAR1
SCHEMBL20350172 0.74 SIGMAR1 (0.37) SIGMAR1SLC6A4
SCHEMBL19121057 0.74 ACACB (0.38) SIGMAR1SLC6A2SLC6A4SLC6A3
SCHEMBL22474189 0.73 IDO1 (0.50) SIGMAR1SRRPSAT1SLC6A2SLC6A4
SCHEMBL10789530 0.72 GBA1 (0.50) MMEACECPA1ACE2EPHX1
SCHEMBL19440420 0.72 SIGMAR1 (0.36) SIGMAR1NAAA
SCHEMBL23483166 0.71 LTA4H (0.56) MEN1KMT2A
SCHEMBL15730472 0.71 GAA (0.47) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
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