SCHEMBL14674

SCHEMBL14674

CCN(C)C(=O)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3448389 0.87 CHRM1 (0.36)
SCHEMBL5837521 0.86 ALDH1A1 (0.33)
SCHEMBL1617287 0.85
SCHEMBL8902429 0.79 LMNA (0.42)
SCHEMBL25473017 0.77
SCHEMBL14617689 0.77 ALDH1A1 (0.39)
SCHEMBL20388653 0.77
SCHEMBL24404206 0.76 ALDH1A1 (0.33)
SCHEMBL8308117 0.75 LMNA (0.43)
SCHEMBL19288013 0.75 EPHX2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5618951-A REACTING A CHLORODIFLUOROACETATE WITH A HALOSILANE USING AN UREA SILVENT AND A REDUCING AGENT ELI LILLY AND COMPANY (US) 1997-04-08 US claimed
JP-3149222-A None JP disclosed
CN-118099173-A Solid-state imaging element, method for manufacturing solid-state imaging element, and electronic device 爱天思株式会社 2024-05-28 CN disclosed
CN-115968391-B Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern 三菱瓦斯化学株式会社 2024-04-26 CN disclosed
CN-117903029-A Onium salt, resist composition, and pattern forming method 信越化学工业株式会社 2024-04-19 CN disclosed
WO-2024081363-A1 COMPOSITION COMPRISING A FIRST RAS INHIBITOR, SECOND RAS INHIBITOR AND A SHP2 INHIBITOR FOR USE IN THE TREATMENT OF CANCER Revolution Medicines, Inc. (US) 2024-04-18 WO disclosed
CN-117865865-A Onium salt, resist composition, and pattern forming method 信越化学工业株式会社 2024-04-12 CN disclosed
CN-117882009-A Composition for spin-on carbon film formation, method for producing composition for spin-on carbon film formation, underlayer film for lithography, method for resist pattern formation, and method for circuit pattern formation 三菱瓦斯化学株式会社 2024-04-12 CN disclosed
CN-117586163-A Onium salt, acid diffusion controlling agent, resist composition, and pattern forming method 信越化学工业株式会社 2024-02-23 CN disclosed
WO-2024015851-A1 TREATMENT OF CELL PROLIFERATION-ASSOCIATED CONDITIONS USING A COMBINATION OF A CLB-B INHIBITOR AND AN ADDITIONAL THERAPEUTIC AGENT HOTSPOT THERAPEUTICS, INC. (US) 2024-01-18 WO disclosed
US-5223498-A Hypoglycemic agents THE BOOTS COMPANY PLC (GB) 1993-06-29 US disclosed
EP-0385038-B1 ORTHO-SUBSTITUTED PHENYL AMIDINE AND PHENYL GUANIDINE DERIVATIVES AND ANTIDIABETIC OR HYPOGLYCAEMIC AGENTS CONTAINING THEM The Boots Company PLC (GB) 1993-06-02 EP disclosed
US-5194660-A Processes for producing carbamates and isocyanates UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-03-16 US disclosed
JP-H03149222-A PRODUCTION OF POLYETHER COMPOUND ASAHI GLASS CO LTD 1991-06-25 JP disclosed
EP-0385038-A1 Ortho-substituted phenyl amidine and phenyl guanidine derivatives and antidiabetic or hypoglycaemic agents containing them The Boots Company PLC (GB) 1990-09-05 EP disclosed
EP-0083096-B1 PRODUCTION OF URETHANE COMPOUNDS Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1987-02-25 EP disclosed
US-4621149-A PLATINUM GROUP METAL HALOGEN OR HALOGEN COMPOUND ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1986-11-04 US disclosed
US-4428923-A Continuous process for the production of hydrogen peroxide according to the anthraquinone process DEGUSSA AKTIENGESELLSCHAFT (DE) 1984-01-31 US disclosed
EP-0083096-A2 Production of urethane compounds Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-07-06 EP disclosed
US-4090024-A Process for the production of skatylhydantoin DEUTSCHE GOLD- UND SILBER-SCHEIDEANSTALT VORMALS ROESSLER (DT) 1978-05-16 US disclosed