⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1470694 | 1.00 | — | — | |
| SCHEMBL2208585 | 0.93 | — | — | |
| SCHEMBL31347477 | 0.86 | — | — | |
| SCHEMBL6889104 | 0.86 | — | — | |
| SCHEMBL644615 | 0.84 | — | — | |
| SCHEMBL5145780 | 0.84 | — | — | |
| SCHEMBL5143934 | 0.84 | — | — | |
| SCHEMBL409141 | 0.84 | — | — | |
| SCHEMBL28448444 | 0.84 | — | — | |
| SCHEMBL3386017 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116694156-A | Antifouling paint composition for ships and preparation method thereof | 苏州鑫新海运有限公司 | 2023-09-05 | — | — | CN | claimed |
| US-6638675-B2 | Fluidity and blackness, but also small in reduction of electric resistance and, therefore, can realize a high image quality and a high copying speed, dispersibility in a binder | TODA KOGYO CORPORATION (JP) | 2003-10-28 | — | — | US | claimed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | claimed |
| CN-116130188-B | AC lightning arrester | 醴陵市东方电瓷电器有限公司 | 2024-12-31 | — | — | CN | disclosed |
| EP-3410468-B1 | N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED | TORAY INDUSTRIES (JP) | 2024-07-10 | — | — | EP | disclosed |
| EP-3382751-B1 | FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT | TORAY INDUSTRIES (JP) | 2023-09-13 | — | — | EP | disclosed |
| CN-116694156-A | Antifouling paint composition for ships and preparation method thereof | 苏州鑫新海运有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-111095566-B | Field effect transistor, method of manufacturing the same, wireless communication device using the same, and merchandise tag | 东丽株式会社 | 2023-05-23 | — | — | CN | disclosed |
| CN-116130188-A | AC lightning arrester | 醴陵市东方电瓷电器有限公司 | 2023-05-16 | — | — | CN | disclosed |
| EP-3514822-B1 | METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE | TORAY INDUSTRIES (JP) | 2023-04-26 | — | — | EP | disclosed |
| CN-108292630-B | Ferroelectric memory element, method for manufacturing the same, memory cell using the same, and wireless communication device using the same | 东丽株式会社 | 2023-04-25 | — | — | CN | disclosed |
| EP-0957474-A1 | Magnetic recording medium | TODA KOGYO CORPORATION (JP) | 1999-11-17 | — | — | EP | disclosed |
| EP-0945766-A2 | Black non-magnetic composite particles for black toner and black toner using the same | TODA KOGYO CORP. (JP) | 1999-09-29 | — | — | EP | disclosed |
| EP-0936507-A2 | Black magnetic composite particles and black magnetic toner using the same | TODA KOGYO CORP. (JP) | 1999-08-18 | — | — | EP | disclosed |
| EP-0924690-A2 | Magnetic recording medium and substrate therefor | TODA KOGYO CORP. (JP) | 1999-06-23 | — | — | EP | disclosed |
| EP-0913431-A2 | Black iron-based composite particles, process for producing the same, paint and rubber or resin composition containing the same | TODA KOGYO CORP. (JP) | 1999-05-06 | — | — | EP | disclosed |
| EP-0475132-B1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN CO (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | disclosed |
| EP-0768352-A1 | MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0475132-A1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-03-18 | — | — | EP | disclosed |