⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1470709 | 0.78 | — | — | |
| SCHEMBL1470071 | 0.76 | — | — | |
| SCHEMBL5471605 | 0.76 | — | — | |
| SCHEMBL8852351 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL3447469 | 0.72 | TSHR (0.30) | — | |
| SCHEMBL122897 | 0.67 | — | — | |
| SCHEMBL7530607 | 0.67 | — | — | |
| SCHEMBL15403142 | 0.66 | — | — | |
| SCHEMBL2816249 | 0.65 | — | — | |
| SCHEMBL5404685 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025022873-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM | 東レ株式会社 | 2025-01-30 | — | — | WO | disclosed |
| US-20240384065-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE | TORAY INDUSTRIES, INC. (JP) | 2024-11-21 | — | — | US | disclosed |
| WO-2024185458-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2024-09-12 | — | — | WO | disclosed |
| EP-3410468-B1 | N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED | TORAY INDUSTRIES (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-117957494-A | Resin composition, light-shielding film, and substrate with partition wall | 东丽株式会社 | 2024-04-30 | — | — | CN | disclosed |
| US-11789363-B2 | Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same | TORAY INDUSTRIES, INC. (JP) | 2023-10-17 | — | — | US | disclosed |
| EP-3382751-B1 | FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT | TORAY INDUSTRIES (JP) | 2023-09-13 | — | — | EP | disclosed |
| CN-111095566-B | Field effect transistor, method of manufacturing the same, wireless communication device using the same, and merchandise tag | 东丽株式会社 | 2023-05-23 | — | — | CN | disclosed |
| EP-3514822-B1 | METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE | TORAY INDUSTRIES (JP) | 2023-04-26 | — | — | EP | disclosed |
| WO-2023048062-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2023-03-30 | — | — | WO | disclosed |
| EP-2360194-A1 | SILOXANE RESIN COMPOSITION AND PROTECTIVE FILM FOR TOUCH PANEL USING SAME | Toray Industries, Inc. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20110068417-A1 | GATE INSULATING MATERIAL, GATE INSULATING FILM AND ORGANIC FIELD-EFFECT TRANSISTOR | TORAY INDUSTRIES, INC. (JP) | 2011-03-24 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| EP-2259289-A1 | GATE INSULATING MATERIAL, GATE INSULATING FILM, AND ORGANIC FIELD EFFECT TRANSISTOR | Toray Industries, Inc. (JP) | 2010-12-08 | — | — | EP | disclosed |
| EP-2239301-A1 | SILOXANE RESIN COMPOSITIONS | Toray Industries, Inc. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100196655-A1 | DISPLAY-USE FILTER | TORAY ADVANCED FILM CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-20090105360-A1 | SILOXANE RESIN COMPOSITION AND PRODUCTION METHOD THEREOF | TORAY INDUSTRIES, INC. (JP) | 2009-04-23 | — | — | US | disclosed |
| EP-1942150-A1 | SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES, INC. (JP) | 2008-07-09 | — | — | EP | disclosed |
| US-20070266896-A1 | Siloxane-Based Coating Material, Optical Article, and Production Method of Siloxane-Based Coating Material | TORAY INDUSTRIES, INC. (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1760126-A1 | SILOXANE COATING MATERIAL, OPTICAL ARTICLES AND PROCESS FOR THE PRODUCTION OF SILOXANE COATING MATERIALS | TORAY INDUSTRIES, INC. (JP) | 2007-03-07 | — | — | EP | disclosed |