SCHEMBL14701791

SCHEMBL14701791

CC(O)(CO)C(=O)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 4/20 0.45
CYP17A1 P05093 3/20 0.45
CACNA1H O95180 3/20 0.36
NAAA Q02083 1/20 0.36
NPSR1 Q6W5P4 3/20 0.35
EPHX2 P34913 1/20 0.35
KMT2A Q03164 4/20 0.34
MEN1 O00255 3/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C19 P33261 1/20 0.34
ALDH1A1 P00352 1/20 0.34
HTT P42858 1/20 0.34
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701795 0.87 TSHR (0.50) CYP19A1CYP17A1NAAANPSR1EPHX2
SCHEMBL14701801 0.85 MDH1 (0.35) CYP19A1CYP17A1NPSR1ALDH1A1TSHR
SCHEMBL19333764 0.80 CYP19A1 (0.48) CYP19A1CYP17A1CACNA1HNAAANPSR1
SCHEMBL12628479 0.80 CYP19A1 (0.43) CYP19A1CYP17A1CACNA1HNAAANPSR1
SCHEMBL14701762 0.80 CYP19A1 (0.40) CYP19A1CYP17A1CACNA1HNAAANPSR1
SCHEMBL13232360 0.80 CYP19A1 (0.50) CYP19A1CYP17A1NAAANPSR1EPHX2
SCHEMBL14701761 0.77 CYP19A1 (0.39) CYP19A1CYP17A1CACNA1HNAAANPSR1
SCHEMBL22333539 0.77 CYP19A1 (0.46) CYP19A1CYP17A1CACNA1HNAAANPSR1
SCHEMBL10257005 0.77 CYP19A1 (0.40) CYP19A1CYP17A1NAAANPSR1EPHX2
SCHEMBL106919 0.77 CYP19A1 (0.46) CYP19A1CYP17A1NAAANPSR1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9051251-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-09 US disclosed
US-9051251-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-09 US disclosed
US-20130040237-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-14 US disclosed
US-20130040237-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130040237-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN F12, C1S, FRG1 CYP19A1 2743/4885CYP17A1 2059/4885CACNA1H 2425/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.