Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.49 |
| ▸ | GAA | P10253 | 3/20 | 0.49 |
| ▸ | HPGD | P15428 | 2/20 | 0.49 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | EP300 | Q09472 | 1/20 | 0.44 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.44 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1470654 | 1.00 | ALDH1A1 (0.49) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL1482753 | 1.00 | ALDH1A1 (0.49) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL5918261 | 0.95 | EP300 (0.45) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL5918260 | 0.95 | EP300 (0.45) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL10097224 | 0.92 | ALDH1A1 (0.40) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL10083959 | 0.92 | ALDH1A1 (0.40) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL18957974 | 0.92 | ALDH1A1 (0.40) | ALDH1A1GAAHPGDPKMMAPT | |
| SCHEMBL28491315 | 0.89 | ALDH1A1 (0.48) | ALDH1A1GAAHPGDMAPTTP53 | |
| SCHEMBL36510 | 0.88 | HSD11B1 (0.46) | ALDH1A1GAAPKMMAPTLMNA | |
| SCHEMBL36511 | 0.88 | HSD11B1 (0.46) | ALDH1A1GAAPKMMAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9650538-B2 | Method for manufacturing micro-structure | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-16 | — | — | US | claimed |
| US-20140296380-A1 | METHOD FOR MANUFACTURING MICRO-STRUCTURE | SHINETSU CHEMICAL CO (JP) | 2014-10-02 | — | — | US | claimed |
| US-6635400-B2 | Alkali-insoluble polymer having acidic groups protected with acid labile groups, photoacid generator, and 1,2-naphthoquinonediazidosulfonyl group-bearing compound; high resolution; plating resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-10-21 | — | — | US | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |
| EP-4273624-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, INTERLAYER INSULATING FILM, SURFACE PROTECTION FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-08 | — | — | EP | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| US-11256174-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| EP-3671345-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2022-02-02 | — | — | EP | disclosed |
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| US-20200201182-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-25 | — | — | US | disclosed |
| EP-3671345-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-06-24 | — | — | EP | disclosed |
| EP-3367164-B1 | PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-11-13 | — | — | EP | disclosed |
| EP-0837367-A2 | Positive resist composition comprising a dipyridyl compound | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| US-5650262-A | High-resolution negative photoresist with wide process latitude | OLIN MICROELECTRONIC CHEMICALS, INC. | 1997-07-22 | — | — | US | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5627011-A | High resolution i-line photoresist of high sensitivity | CIBA-GEIGY CORPORATION (US) | 1997-05-06 | — | — | US | disclosed |
| US-4544752-A | TREATMENT OF GOUT; ANTIARTHRITIC AGENTS | ELI LILLY AND COMPANY (US) | 1985-10-01 | — | — | US | disclosed |
| EP-0048615-B1 | IMPROVEMENTS IN OR RELATING TO 3-ARYL-5-ISOTHIAZOLE DERIVATIVES | ELI LILLY AND COMPANY (US) | 1984-05-30 | — | — | EP | disclosed |
| US-4346094-A | ENZYME INHIBITORS | ELI LILLY AND COMPANY (US) | 1982-08-24 | — | — | US | disclosed |
| EP-0048615-A1 | Improvements in or relating to 3-aryl-5-isothiazole derivatives | ELI LILLY AND COMPANY (US) | 1982-03-31 | — | — | EP | disclosed |