Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | F2 | P00734 | 1/20 | 0.30 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.30 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.30 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14707489 | 0.77 | F2 (0.31) | F2PRSS1PRSS2PRSS3 | |
| SCHEMBL6440094 | 0.76 | F2 (0.33) | F2PRSS1PRSS2PRSS3 | |
| SCHEMBL16593512 | 0.69 | CES1 (0.41) | F2 | |
| SCHEMBL2744267 | 0.69 | CA1 (0.33) | — | |
| SCHEMBL15744280 | 0.69 | — | — | |
| SCHEMBL14107990 | 0.67 | MAPT (0.32) | — | |
| SCHEMBL215513 | 0.67 | CA1 (0.32) | — | |
| Trifluoroacetic Acid SCHEMBL27574779 | 0.63 | ALDH1A1 (0.39) | — | |
| Trifluoroacetic Acid SCHEMBL27753856 | 0.63 | ALDH1A1 (0.39) | F2PRSS1PRSS2PRSS3 | |
| SCHEMBL3743311 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |