SCHEMBL215513

SCHEMBL215513

C=NOS(=O)(=O)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA13 Q8N1Q1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2744267 0.74 CA1 (0.33) CA1CA2CA7CA13
SCHEMBL1759144 0.67
SCHEMBL6440094 0.67 F2 (0.33)
SCHEMBL7547616 0.67
SCHEMBL14712451 0.67 F2 (0.30)
SCHEMBL7901665 0.67
SCHEMBL22838121 0.67 CA2 (0.35) CA1CA2
SCHEMBL160 0.65 CA2 (0.41) CA1CA2CA7CA13
SCHEMBL758884 0.65 CA2 (0.41) CA1CA2CA7CA13
SCHEMBL2085247 0.65 CA2 (0.41) CA1CA2CA7CA13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120077941-A1 POLYMERS FUNCTIONALIZED WITH PROTECTED OXIME COMPOUNDS BRIDGESTONE CORPORATION (JP) 2012-03-29 US claimed
US-8088868-B2 oximation of cojugated homopolymers formed by addtion polymerization of conjugated diene monomer in the presence lanthanide copmpounds as polymerization catalysts; polymers used in the manufacture of tires having reduced hysteresis BRIDGESTONE CORPORATION (JP) 2012-01-03 US claimed
US-20080146745-A1 POLYMERS FUNCTIONALIZED WITH PROTECTED OXIME COMPOUNDS BRIDGESTONE CORPORATION (JP) 2008-06-19 US claimed
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-108107676-B Chemically amplified positive resist film laminate and pattern formation method 信越化学工业株式会社 2023-02-21 CN disclosed
CN-108459469-B Pattern forming method 信越化学工业株式会社 2022-11-11 CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed
CN-106610566-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2021-10-08 CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN disclosed
WO-2021079679-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD 信越化学工業株式会社 2021-04-29 WO disclosed
CN-106444288-B Chemically amplified positive resist composition and pattern forming method 信越化学工业株式会社 2021-04-09 CN disclosed
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 CN disclosed
CN-111338181-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2020-06-26 CN disclosed
US-8541509-B2 Polymers functionalized with protected oxime compounds BRIDGESTONE CORPORATION (JP) 2013-09-24 US disclosed
US-20120077941-A1 POLYMERS FUNCTIONALIZED WITH PROTECTED OXIME COMPOUNDS BRIDGESTONE CORPORATION (JP) 2012-03-29 US disclosed
US-8088868-B2 oximation of cojugated homopolymers formed by addtion polymerization of conjugated diene monomer in the presence lanthanide copmpounds as polymerization catalysts; polymers used in the manufacture of tires having reduced hysteresis BRIDGESTONE CORPORATION (JP) 2012-01-03 US disclosed
US-20080146745-A1 POLYMERS FUNCTIONALIZED WITH PROTECTED OXIME COMPOUNDS BRIDGESTONE CORPORATION (JP) 2008-06-19 US disclosed